基于共价有机框架的光电双调制忆阻器用于晶圆表面质量评价

IF 17.3 1区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Matter Pub Date : 2025-06-05 DOI:10.1016/j.matt.2025.102197
Jinyong Li, Bin Zhang, Bowen Zhou, Minghan Xiang, Yue Hu, Yang Gao, Fuzhen Xuan
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引用次数: 0

摘要

光电忆阻器正在成为推进边缘计算技术的关键部件。共价有机框架(COFs)以其稳定性、规律性和可调结构为特征,在提高这些器件的性能方面发挥着关键作用。本研究提出了一种由光响应单元二乙烯和氧化还原活性单元三苯胺组成的COF薄膜ODAE-COF。所研制的ITO/ odaio - cof /ITO光电忆阻器在可见光和紫外光下均表现出全面的光诱导突触可塑性,有效地模拟了人脑学习和遗忘的认知过程。重要的是,该忆阻器可实现64种不同的电导状态,可由光脉冲和电脉冲操纵。集成到边缘计算系统中,忆阻器可以评估晶圆表面,检测空隙并以90%的准确率对粗糙度进行分类。这些发现突出了odae - cof光电子忆阻器在推进集成边缘计算应用方面的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Covalent organic framework-based photoelectric dual-modulated memristors for wafer surface quality evaluation

Covalent organic framework-based photoelectric dual-modulated memristors for wafer surface quality evaluation
Optoelectronic memristors are emerging as crucial components in advancing edge computing technologies. Covalent organic frameworks (COFs), characterized by their stability, regularity, and tunable structures, play a critical role in enhancing the capabilities of these devices. This study presents a COF film, ODAE-COF, comprised of the photoresponsive unit diarylethene and the redox-active unit triphenylamine. The developed ITO/ODAE-COF/ITO optoelectronic memristor exhibits comprehensive light-induced synaptic plasticity under both visible and ultraviolet light, effectively simulating the cognitive processes of learning and forgetting in the human brain. Importantly, the memristor achieves 64 distinct conductance states manipulated by both light and electrical pulses. Integrated into an edge computing system, the memristor evaluates wafer surfaces, detecting voids and classifying roughness with >90% accuracy. These findings highlight the potential of the ODAE-COF-based optoelectronic memristor in advancing integrated edge computing applications.
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来源期刊
Matter
Matter MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
26.30
自引率
2.60%
发文量
367
期刊介绍: Matter, a monthly journal affiliated with Cell, spans the broad field of materials science from nano to macro levels,covering fundamentals to applications. Embracing groundbreaking technologies,it includes full-length research articles,reviews, perspectives,previews, opinions, personnel stories, and general editorial content. Matter aims to be the primary resource for researchers in academia and industry, inspiring the next generation of materials scientists.
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