配体性质与光催化效率的关联:界面工程的计算框架

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Sohini Khan, Kalyani Patrikar, Ram Sewak and Anirban Mondal*, 
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引用次数: 0

摘要

我们提出应用Marcus-Hush形式作为理论框架来研究配体保护的Au系统中的电荷转移动力学。通过集成能级差和电子耦合等关键参数,该方法能够预测电子驱动水分解的光催化效率。各种配体功能化AuNPs的模拟建立了电荷转移速率与氢演化之间的明确相关性,特别是对于带有各种对取代基的芳香硫醇的功能化AuNPs。此外,我们将这一框架扩展到硒醇取代体系,揭示了虽然硒醇在某些情况下与硫醇表现相当,但它们并不能始终增强光催化活性。除了电子驱动制氢之外,我们还进一步探索了配体化学在调节与氧化半反应相关的空穴转移过程中的作用。在这种情况下,oh -硫醇配体功能化的AuNP成为空穴驱动反应中最有效的光催化剂。总的来说,本研究为筛选和设计配体功能化的AuNP光催化剂提供了一种系统的方法,为配体性质如何影响光催化性能提供了机制见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Correlating Ligand Properties with Photocatalytic Efficiency: A Computational Framework for Interface Engineering

Correlating Ligand Properties with Photocatalytic Efficiency: A Computational Framework for Interface Engineering

We present the application of the Marcus–Hush formalism as a theoretical framework to investigate charge transfer dynamics in ligand-protected Au systems. By integrating key parameters such as energy level differences and electronic coupling, this approach enables the prediction of photocatalytic efficiency in electron-driven water splitting. Simulations of diverse ligand-functionalized AuNPs establish a clear correlation between charge transfer rates and hydrogen evolution, specifically for functionalized AuNPs bearing aromatic thiols with various para-substituents. Additionally, we extend this framework to selenol-substituted systems, revealing that while selenols perform comparably to thiols in some cases, they do not consistently enhance photocatalytic activity. Beyond electron-driven hydrogen production, we further explore the role of ligand chemistry in modulating hole transfer processes relevant to oxidative half-reactions. In this context, the OH-thiol ligand-functionalized AuNP emerges as the most effective photocatalyst for hole-driven reactions. Overall, this study provides a systematic methodology for screening and designing ligand-functionalized AuNP photocatalysts, offering mechanistic insights into how ligand properties govern photocatalytic performance.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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