金属半导体纳米结构中Tamm态对电子隧穿肖特基势垒和体电子光发射的影响

IF 2.9 3区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Renat Sh. Ikhsanov , Igor V. Smetanin , Igor E. Protsenko , Alexander V. Uskov
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引用次数: 0

摘要

建立了一个计算具有肖特基势垒的金属半导体结构中Tamm准能级的模型。该模型表明,电子共振隧穿可以通过肖特基势垒在金属-半导体界面的准能级上发生。Tamm准能级共振隧穿可以强烈影响等离子体结构中从金属到周围半导体的电子光发射,降低光效应的红极限,显著提高等离子体结构中光发射的内部量子效率和热载流子产生的量子产率,特别是光化学(光催化)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effects of Tamm state on electron tunneling through Schottky barrier and on bulk electron photoemission in metal-semiconductor nanostructures
A model has been developed to calculate the Tamm quasi-level in metal-semiconductor structures with Schottky barrier. The model was used to show that electron resonance tunneling from metal to semiconductor through the Schottky barrier can occur with the Tamm quasi-level at the metal-semiconductor interface. The resonance tunneling with the Tamm quasi-level can strongly affect the electron photoemission in plasmonic structures from the metal to the surrounding semiconductor, lowering the red limit of the photoeffect and significantly increasing the internal quantum efficiency of photoemission and the quantum yield of hot carrier generation in plasmonic structures, especially for photochemistry (photocatalysis).
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来源期刊
CiteScore
5.00
自引率
3.70%
发文量
77
审稿时长
62 days
期刊介绍: This journal establishes a dedicated channel for physicists, material scientists, chemists, engineers and computer scientists who are interested in photonics and nanostructures, and especially in research related to photonic crystals, photonic band gaps and metamaterials. The Journal sheds light on the latest developments in this growing field of science that will see the emergence of faster telecommunications and ultimately computers that use light instead of electrons to connect components.
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