二维范德华多值逻辑技术的进展与挑战

IF 15.8 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
ACS Nano Pub Date : 2025-05-29 DOI:10.1021/acsnano.5c02629
Kyu-Hyun Han, Hyun-Yong Yu
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引用次数: 0

摘要

自半导体行业成立以来,二进制逻辑计算系统已深深嵌入我们的社区。然而,随着人工智能时代的到来,基于硅cmos的二进制逻辑系统的信息处理速度已经达到了现有技术的极限。为了克服这一问题,多值逻辑(MVL)作为一种高密度计算系统受到了人们的关注,因为它比二进制逻辑具有更少的单元设备和更低的功耗,可以快速处理大量信息。此外,随着摩尔定律接近1nm节点时代,二维范德华(vdW)材料因其克服Si材料局限性的潜力而受到重视。因此,2D vdW MVL技术代表了对设备小型化至关重要的下一代高密度计算系统。本文综述了二维vdW MVL的技术进展。首先,阐述了二维vdW MVL技术的发展历史和实现MVL技术的各种工作原理。接下来,对实现vdW MVL的各种技术进行了分类,并讨论了这些技术的发展。最后,对vdW MVL的技术现状和未来发展前景进行了总结。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Progress and Challenges of 2D van der Waals Multi-Valued Logic Technology

Progress and Challenges of 2D van der Waals Multi-Valued Logic Technology
Since the inception of the semiconductor industry, binary logic computing systems have been deeply embedded in our community. However, with the advent of the AI era, the information processing speed of Si CMOS-based binary logic systems has reached its limits with the current technology. For overcoming this, multi-valued logic (MVL) has garnered attention as a high-density computing system that can rapidly process large amounts of information due to there being fewer unit devices and it having low power consumption compared to binary logic. Furthermore, as we approach the 1 nm node era by Moore’s Law, 2D van der Waals (vdW) materials are highlighted for their potential to overcome the limitations of Si materials. Therefore, 2D vdW MVL technology represents the next-generation high-density computing system that is essential for device miniaturization. Here, this review introduces the technological advancements of 2D vdW MVL. First, the history of 2D vdW MVL and the various operation principles are explained for implementing MVL technology. Next, various techniques for implementing vdW MVL were categorized, and the development of these techniques was discussed over time. Finally, this review presents the conclusion by examining the current technological status of vdW MVL and its future prospects.
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来源期刊
ACS Nano
ACS Nano 工程技术-材料科学:综合
CiteScore
26.00
自引率
4.10%
发文量
1627
审稿时长
1.7 months
期刊介绍: ACS Nano, published monthly, serves as an international forum for comprehensive articles on nanoscience and nanotechnology research at the intersections of chemistry, biology, materials science, physics, and engineering. The journal fosters communication among scientists in these communities, facilitating collaboration, new research opportunities, and advancements through discoveries. ACS Nano covers synthesis, assembly, characterization, theory, and simulation of nanostructures, nanobiotechnology, nanofabrication, methods and tools for nanoscience and nanotechnology, and self- and directed-assembly. Alongside original research articles, it offers thorough reviews, perspectives on cutting-edge research, and discussions envisioning the future of nanoscience and nanotechnology.
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