基于聚苯胺/二硫化钼异质结晶体管的设计与分析,以提高模拟性能

IF 3 Q2 PHYSICS, CONDENSED MATTER
Shivangi Srivastava, Sajal Agarwal
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引用次数: 0

摘要

本研究通过对聚苯胺/二硫化钼晶体管的各种电学特性的评估,分析了其异质结的性能。在电气和射频特性方面进行了全面的研究,以批判性地分析所提出的器件性能。在较低的栅极电压(0.9 V)下,通道长度为3.5μm的器件在阈值电压(Vth) =−0.39 V、通断比= 1011、氧化物电容(Cgg)=40μF/m2、最大漏极电流= 27μA等方面表现优异。对于32nm器件,最大漏极电流可进一步提高1.7 mA。根据所获得的参数值,所提出的晶体管可用于各种应用,如内存存储和模拟电路。然而,高开/关比和低Vth也保证了它在不同开关和低功耗器件中的实用性。还详细讨论了所提出装置的物理实现,以提供结果的验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Design and analysis of PANI/MoS2 heterojunction-based transistors for improved analog performance

Design and analysis of PANI/MoS2 heterojunction-based transistors for improved analog performance
This study analyzes the performance of heterojunction of a PANI/MoS2 transistor through an evaluation of its various electrical characteristics. A comprehensive study is done to critically analyze the proposed device performance in terms of electrical and RF characteristics. Proposed device with channel length of 3.5μm exhibited superior performance in terms of threshold voltage (Vth) = −0.39 V, on/off ratio = 1011, oxide capacitance (Cgg)=40μF/m2 and maximum drain current = 27μA at comparatively lower gate voltage, i.e. 0.9 V. Maximum drain current can be further increased by 1.7 mA for 32 nm device. With the achieved parameter values, the proposed transistor can be employed for various applications, such as memory storage and analog circuits. However, high on/off ratio and low Vth also ensure its usefulness in different switching and low-power devices. Physical realization of the proposed device is also discussed in detail to provide validation of results.
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CiteScore
6.50
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