Dongjae Lee, Jiyu Park, Taewoong Kim, Jeongwon Lee and Taekyeong Kim*,
{"title":"二硫化钼纳米片上纳米气泡中的电荷阱动力学:对二维电子器件可靠性的影响","authors":"Dongjae Lee, Jiyu Park, Taewoong Kim, Jeongwon Lee and Taekyeong Kim*, ","doi":"10.1021/acsanm.5c0210410.1021/acsanm.5c02104","DOIUrl":null,"url":null,"abstract":"<p >The performance of MoS<sub>2</sub> transistors is significantly influenced by charge trapping in pre-existing traps with a wide range of time constants. In this study, we investigate local charge trapping dynamics in nanoscale bubbles on MoS<sub>2</sub> by comparing the frequency-dependent Fermi-level hysteresis (Δ<i>V</i>) in gate sweep measurements between bubble and flat regions using Kelvin probe force microscopy. We find that Δ<i>V</i> increases as the gate sweep frequency (<i>f</i>) decreases in both regions. However, it remains consistently larger in the bubble regions across all frequencies. The stronger <i>f</i>-dependence of Δ<i>V</i> in bubbles compared to flat regions is attributed to slow traps caused by water molecules confined within the bubbles. Humidity-controlled measurements reveal that in flat regions, adsorbed water molecules also enhance Δ<i>V</i> at lower frequencies, confirming the role of water as a dominant trapping source. To rule out other extrinsic trap sources, we repeat the measurements using an hBN insulating layer and observe similar behavior. These results demonstrate that water molecules in nanoscale bubbles act as slow charge traps and are a major contributor to hysteresis and instability, offering insights for improving the reliability of 2D electronic devices.</p>","PeriodicalId":6,"journal":{"name":"ACS Applied Nano Materials","volume":"8 21","pages":"11185–11191 11185–11191"},"PeriodicalIF":5.3000,"publicationDate":"2025-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Charge Trap Dynamics in Nanobubbles on MoS2 Nanosheets: Implications for Reliability in 2D Electronic Devices\",\"authors\":\"Dongjae Lee, Jiyu Park, Taewoong Kim, Jeongwon Lee and Taekyeong Kim*, \",\"doi\":\"10.1021/acsanm.5c0210410.1021/acsanm.5c02104\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p >The performance of MoS<sub>2</sub> transistors is significantly influenced by charge trapping in pre-existing traps with a wide range of time constants. In this study, we investigate local charge trapping dynamics in nanoscale bubbles on MoS<sub>2</sub> by comparing the frequency-dependent Fermi-level hysteresis (Δ<i>V</i>) in gate sweep measurements between bubble and flat regions using Kelvin probe force microscopy. We find that Δ<i>V</i> increases as the gate sweep frequency (<i>f</i>) decreases in both regions. However, it remains consistently larger in the bubble regions across all frequencies. The stronger <i>f</i>-dependence of Δ<i>V</i> in bubbles compared to flat regions is attributed to slow traps caused by water molecules confined within the bubbles. Humidity-controlled measurements reveal that in flat regions, adsorbed water molecules also enhance Δ<i>V</i> at lower frequencies, confirming the role of water as a dominant trapping source. To rule out other extrinsic trap sources, we repeat the measurements using an hBN insulating layer and observe similar behavior. These results demonstrate that water molecules in nanoscale bubbles act as slow charge traps and are a major contributor to hysteresis and instability, offering insights for improving the reliability of 2D electronic devices.</p>\",\"PeriodicalId\":6,\"journal\":{\"name\":\"ACS Applied Nano Materials\",\"volume\":\"8 21\",\"pages\":\"11185–11191 11185–11191\"},\"PeriodicalIF\":5.3000,\"publicationDate\":\"2025-05-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ACS Applied Nano Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://pubs.acs.org/doi/10.1021/acsanm.5c02104\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Nano Materials","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsanm.5c02104","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Charge Trap Dynamics in Nanobubbles on MoS2 Nanosheets: Implications for Reliability in 2D Electronic Devices
The performance of MoS2 transistors is significantly influenced by charge trapping in pre-existing traps with a wide range of time constants. In this study, we investigate local charge trapping dynamics in nanoscale bubbles on MoS2 by comparing the frequency-dependent Fermi-level hysteresis (ΔV) in gate sweep measurements between bubble and flat regions using Kelvin probe force microscopy. We find that ΔV increases as the gate sweep frequency (f) decreases in both regions. However, it remains consistently larger in the bubble regions across all frequencies. The stronger f-dependence of ΔV in bubbles compared to flat regions is attributed to slow traps caused by water molecules confined within the bubbles. Humidity-controlled measurements reveal that in flat regions, adsorbed water molecules also enhance ΔV at lower frequencies, confirming the role of water as a dominant trapping source. To rule out other extrinsic trap sources, we repeat the measurements using an hBN insulating layer and observe similar behavior. These results demonstrate that water molecules in nanoscale bubbles act as slow charge traps and are a major contributor to hysteresis and instability, offering insights for improving the reliability of 2D electronic devices.
期刊介绍:
ACS Applied Nano Materials is an interdisciplinary journal publishing original research covering all aspects of engineering, chemistry, physics and biology relevant to applications of nanomaterials. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials, engineering, physics, bioscience, and chemistry into important applications of nanomaterials.