ITO超表面辅助准近场聚焦增强ZnO光电探测器的光响应

IF 6.3 2区 材料科学 Q2 CHEMISTRY, PHYSICAL
Ajinkya Palwe, Chandan Kumar, Shobha Shukla, Sumit Saxena
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引用次数: 0

摘要

超表面可以对入射电磁波的振幅、相位和极化进行工程处理,从而提供对其固有特性的鲁棒控制。这导致了超紧凑光学器件的发展。氧化铟锡(ITO)用作各种光电器件的电极。ITO超表面与光电器件的集成可以消除对额外层的需求,因为它们可以同时作为透明电极和光捕获元件。在这里,我们报道了ITO超表面的设计和制造,以在准近场集中UV -可见光(~ 350 nm至550 nm)。利用飞秒激光直写技术,制备了ITO超表面,每侧尺寸为1.3 µm,厚度为120 nm,周期为2 µm的方形贴片。ITO贴片的周期性排列有利于准近场电场热点的形成,这是由于衍射光和导模共振的相构干涉。我们将这些超表面结合到基于ZnO量子点的紫外光电探测器上,由于增强的光-物质相互作用,其光响应性提高了约183 %。提出的工作强调了ITO超表面作为一种有前途的技术在高性能、超灵敏光器件的发展潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

ITO metasurface assisted quasi near-field focusing for enhanced photoresponse in ZnO photodetectors

ITO metasurface assisted quasi near-field focusing for enhanced photoresponse in ZnO photodetectors
Metasurfaces enable engineering of amplitude, phase, and polarization of incident electromagnetic waves, thereby providing robust control over their intrinsic properties. This has resulted in development of ultra-compact optical devices. Indium tin oxide (ITO) is used as an electrode in various optoelectronic devices. Integration of ITO metasurfaces with optoelectronic devices can eliminate the need for additional layers, as they can simultaneously serve as transparent electrode along with light-trapping element. Here, we report design and fabrication of ITO metasurface to concentrate UV– visible light (∼350 nm to 550 nm) in the quasi near field. ITO metasurfaces in form of square patches measuring 1.3 µm on each side, with thickness of 120 nm, and a periodicity of 2 µm were fabricated using femtosecond laser-based direct writing. The periodic arrangement of ITO patches facilitate the formation of electric field hotspots in the quasi near field due to the constructive interference of the diffracted light and guided mode resonance. We incorporated these metasurfaces onto ZnO quantum dots-based UV photodetectors, which exhibited about 183 % enhancement in the photoresponsivity due to the enhanced light-matter interactions. The proposed work highlights the potential of ITO metasurfaces as a promising technology in the development of high-performance, ultrasensitive photodevices.
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来源期刊
Applied Surface Science
Applied Surface Science 工程技术-材料科学:膜
CiteScore
12.50
自引率
7.50%
发文量
3393
审稿时长
67 days
期刊介绍: Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.
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