{"title":"Co/Ce共掺杂ZnO薄膜的光学效应和缺陷研究","authors":"L. Arda, E. Ozugurlu","doi":"10.1007/s10854-025-14890-0","DOIUrl":null,"url":null,"abstract":"<div><p>Ce-doped ZnCoO (Zn<sub>0.99-x</sub>Co<sub>0.01</sub>Ce<sub>x</sub>O) thin films (with <i>x</i> = 0.00 to 0.05 in increments of 0.01) were grown using the sol–gel technique to investigate the influence of defects on their optical properties. By applying a Double Facet Coated Substrate (DFCS) theoretical transmittance model to analyze the optical transmittance data, the thickness, absorption loss, extinction coefficient, and refractive index of the thin films were determined. The films’ thicknesses and refractive indices ranged from <span>\\(350\\)</span> to <span>\\(455\\)</span> nm and <span>\\(1.71\\)</span> to <span>\\(2.02\\)</span>, respectively. The optical band gap fluctuates as the Ce concentration increases from 0.00 to 0.05, and the extinction coefficient fluctuates with Ce concentration, and a maximum occurs at the 4% Ce concentration following the Sellmeier dispersion relation. However, the highest Urbach energy, <span>\\(904\\pm 613\\)</span> meV, was observed for the 2% Ce-doped film. The photoluminescence (PL) spectra of Co/Ce co-doped ZnO thin films reveal the relative contributions of defects, namely Zn<sub>i</sub> (zinc interstitials), V<sub>Z</sub>ₙ (zinc vacancies), and O<sub>i</sub> (oxygen interstitials). X-ray diffraction (XRD) and scanning electron microscopy (SEM) were employed to analyze the structural properties and surface morphology of the films. Additionally, energy-dispersive spectroscopy (EDS) was used to determine the elemental composition of the thin films. This study demonstrates the effective use of the DFCS model to accurately determine the refractive index and extinction coefficient, two critical parameters for modeling photolithographic processes in the semiconductor industry.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"36 15","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s10854-025-14890-0.pdf","citationCount":"0","resultStr":"{\"title\":\"The effects of Co/Ce co-doped ZnO thin films: an optical and defect study\",\"authors\":\"L. Arda, E. 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The optical band gap fluctuates as the Ce concentration increases from 0.00 to 0.05, and the extinction coefficient fluctuates with Ce concentration, and a maximum occurs at the 4% Ce concentration following the Sellmeier dispersion relation. However, the highest Urbach energy, <span>\\\\(904\\\\pm 613\\\\)</span> meV, was observed for the 2% Ce-doped film. The photoluminescence (PL) spectra of Co/Ce co-doped ZnO thin films reveal the relative contributions of defects, namely Zn<sub>i</sub> (zinc interstitials), V<sub>Z</sub>ₙ (zinc vacancies), and O<sub>i</sub> (oxygen interstitials). X-ray diffraction (XRD) and scanning electron microscopy (SEM) were employed to analyze the structural properties and surface morphology of the films. Additionally, energy-dispersive spectroscopy (EDS) was used to determine the elemental composition of the thin films. This study demonstrates the effective use of the DFCS model to accurately determine the refractive index and extinction coefficient, two critical parameters for modeling photolithographic processes in the semiconductor industry.</p></div>\",\"PeriodicalId\":646,\"journal\":{\"name\":\"Journal of Materials Science: Materials in Electronics\",\"volume\":\"36 15\",\"pages\":\"\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2025-05-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://link.springer.com/content/pdf/10.1007/s10854-025-14890-0.pdf\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Science: Materials in Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10854-025-14890-0\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-025-14890-0","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
摘要
采用溶胶-凝胶法制备了掺杂铈的ZnCoO (zn0.99 - xco0.01 1cexo)薄膜(x = 0.00 ~ 0.05,增量为0.01),研究了缺陷对薄膜光学性能的影响。采用双面涂层基板(DFCS)理论透光率模型分析了薄膜的透光率数据,确定了薄膜的厚度、吸收损耗、消光系数和折射率。薄膜的厚度和折射率分别为\(350\) ~ \(455\) nm和\(1.71\) ~ \(2.02\)。光带隙随Ce浓度从0.00 ~ 0.05的增加而波动,消光系数随Ce浓度的增加而波动,消光系数在4时达到最大值% Ce concentration following the Sellmeier dispersion relation. However, the highest Urbach energy, \(904\pm 613\) meV, was observed for the 2% Ce-doped film. The photoluminescence (PL) spectra of Co/Ce co-doped ZnO thin films reveal the relative contributions of defects, namely Zni (zinc interstitials), VZₙ (zinc vacancies), and Oi (oxygen interstitials). X-ray diffraction (XRD) and scanning electron microscopy (SEM) were employed to analyze the structural properties and surface morphology of the films. Additionally, energy-dispersive spectroscopy (EDS) was used to determine the elemental composition of the thin films. This study demonstrates the effective use of the DFCS model to accurately determine the refractive index and extinction coefficient, two critical parameters for modeling photolithographic processes in the semiconductor industry.
The effects of Co/Ce co-doped ZnO thin films: an optical and defect study
Ce-doped ZnCoO (Zn0.99-xCo0.01CexO) thin films (with x = 0.00 to 0.05 in increments of 0.01) were grown using the sol–gel technique to investigate the influence of defects on their optical properties. By applying a Double Facet Coated Substrate (DFCS) theoretical transmittance model to analyze the optical transmittance data, the thickness, absorption loss, extinction coefficient, and refractive index of the thin films were determined. The films’ thicknesses and refractive indices ranged from \(350\) to \(455\) nm and \(1.71\) to \(2.02\), respectively. The optical band gap fluctuates as the Ce concentration increases from 0.00 to 0.05, and the extinction coefficient fluctuates with Ce concentration, and a maximum occurs at the 4% Ce concentration following the Sellmeier dispersion relation. However, the highest Urbach energy, \(904\pm 613\) meV, was observed for the 2% Ce-doped film. The photoluminescence (PL) spectra of Co/Ce co-doped ZnO thin films reveal the relative contributions of defects, namely Zni (zinc interstitials), VZₙ (zinc vacancies), and Oi (oxygen interstitials). X-ray diffraction (XRD) and scanning electron microscopy (SEM) were employed to analyze the structural properties and surface morphology of the films. Additionally, energy-dispersive spectroscopy (EDS) was used to determine the elemental composition of the thin films. This study demonstrates the effective use of the DFCS model to accurately determine the refractive index and extinction coefficient, two critical parameters for modeling photolithographic processes in the semiconductor industry.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.