非晶ITO薄膜中电学和结构变化的相关性

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-05-23 DOI:10.1016/j.vacuum.2025.114441

Seonghoon Han , Yeongjun Son , Sehwan Song , Jisung Lee , Jong-Seong Bae , Anh Tuan Thanh Pham , Thang Bach Phan , Jeong Hwan Kim , Jong Mok Ok , Dooyong Lee , Sungkyun Park

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引用次数: 0

摘要

我们用原位分析的方法研究了非晶ITO薄膜在真空退火过程中的温度依赖性电阻、结构特性和化学状态。原位电阻测量显示电阻急剧增加，在180℃左右达到最大值，并随着退火温度的进一步升高而减小。原位x射线衍射证实了非晶态ITO薄膜在电阻率急剧升高的温度下开始结晶。通过原位XPS分析，我们没有发现化学状态的变化，如氧空位或Sn4+的形成。在霍尔效应测量中，我们证实了在175°C真空退火下ITO薄膜的迁移率显著降低。这表明ITO结晶形成的晶界增加了电子散射，导致电阻在180℃时急剧增加。我们的研究结果表明，在退火过程中，结构变化主要驱动了非晶ITO电学性能的变化。这项研究强调了实时监测在理解ITO薄膜动态变化中的重要性，并提供了对结晶过程中结构和电转变的全面理解。

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Correlation between electrical and structural changes in amorphous ITO films

We investigated the temperature-dependent resistance, structural properties, and chemical state of amorphous ITO film during annealing under vacuum using in-situ analyses. In-situ resistance measurement revealed a sharp increase in resistance, reaching a maximum at approximately 180 °C and decreasing with a further increase in annealing temperature. In-situ X-ray diffraction confirmed the onset of crystallization of the amorphous ITO film at the temperature where the resistivity increased sharply. From the in-situ XPS analysis, we found no change in chemical states, such as oxygen vacancy or the formation of Sn⁴⁺. In the Hall effect measurement, we confirmed a significant decrease in mobility at the ITO film annealed in vacuum at 175 °C. This indicates the grain boundaries formed by the crystallization of ITO increase the electron scattering, causing a sharp increase in resistance at 180 °C. Our findings suggest that structural changes primarily drove the change in electrical properties of amorphous ITO during annealing. This study highlights the importance of real-time monitoring in understanding the dynamic change in ITO film and provides a comprehensive understanding of the structural and electrical transitions during crystallization.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.