基于WO3修饰ErVO4纳米颗粒的超灵敏三乙胺传感器

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-05-23 DOI:10.1016/j.vacuum.2025.114440

Yuxiang Zhao, Shijie Lu, Minyuan Lv, Jinye Liu, Yue Chen, Yijia Wang, Hui Zhou, Xiaoxuan Che, Baozhong Kang, Qianqian Zhang

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引用次数: 0

摘要

采用静电纺丝和水热相结合的方法合成了对三乙胺具有良好选择性的ErVO4/WO3复合材料。与传统气体传感器相比，该传感器的最佳工作温度显著降低；温度只有200°C。与ErVO4传感器相比，ErVO4/WO3传感器在气敏响应、检测限、稳定性和解吸时间等关键性能指标上有了实质性的改进。在最佳温度为200℃时，ErVO4/WO3复合材料对浓度为100 ppm的三乙胺气体的响应为15.79。更重要的是，该传感器的稳定性大大提高，与纯ErVO4传感器相比，其解吸时间缩短了32秒。回收时间的显著缩短使其在工业应用领域具有极其广阔的应用前景。利用X射线粉末衍射（XRD）、扫描电子显微镜（SEM）、透射电子显微镜（TEM）、紫外-可见吸收光谱（UV-VIS）、紫外光电子能谱（UPS）和X射线光电子能谱（XPS）分析了材料的微观结构和元素组成。结果表明，ErVO4和WO3的复合配方是提高三乙胺传感性能的有效途径。该复合材料具有高灵敏度、高稳定性和低检测限的特点，具有制造三乙胺传感器的巨大潜力。本工作为传感器技术在相关领域的发展提供了重要的参考和研究方向。

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An ultra-sensitive triethylamine sensor based on WO3 modified ErVO4 nanoparticles

ErVO₄/WO₃ composites, which exhibit superior selectivity towards triethylamine, were synthesized through a combination of electrospinning and a straightforward hydrothermal method. In comparison with traditional gas sensors, the optimal operating temperature of this sensor is significantly decreased; it is merely 200 °C. When contrasted with the ErVO₄ sensor, the ErVO₄/WO₃ sensor manifested a substantial improvement in key performance indicators, such as gas - sensing response, detection limit, stability, and desorption time. At the optimal temperature of 200 °C, the ErVO₄/WO₃ composite displayed a response of 15.79 to triethylamine gas at a concentration of 100 ppm. More significantly, while the stability of this sensor has been considerably enhanced, its desorption time has been shortened by 32 s as compared to that of the pure ErVO₄ sensor. The marked reduction in the recovery time endows it with extremely broad application prospects within the realm of industrial applications. X - ray powder diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), UV–VIS ab-sorption spectra, ultraviolet photo-electron spectroscopy (UPS), and X - ray photoelectron spectroscopy (XPS) were utilized to examine the microstructure and elemental composition. The results indicated that the composite formulation of ErVO₄ and WO₃ represents an effective approach to enhancing the sensing performance of triethylamine. This composite demonstrated significant potential for the fabrication of triethylamine sensors characterized by high sensitivity, robust stability, and a low detection limit. This work provides a crucial reference and research direction for the advancement of sensor technology in relevant fields.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.