预构建复合沉积层增强Ti-6Al-4V与CFRTP激光焊接接头界面

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Pengyuan Zou , Lixi Tian , Shanling Wang , Chenshan Wu , Rui Zhou
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引用次数: 0

摘要

采用电化学沉积法在Ti-6Al-4V表面制备了Ni-PEEK复合层,改善了处理后的Ti-6Al-4V与CFRTP激光接头的界面结构。对界面结构进行了研究,并分析了接头的形成机理。结果表明:接头稳定,接头抗剪强度达141.7 N/mm;分解或熔融或PEEK颗粒的插入为界面连接提供了有利条件,复合层与CFRTP之间形成了三种“钉住”结构。然后在界面处发生了强烈的化学反应,发现钛原子与CFRTP和Ni层中的碳原子直接反应。从而在界面处生成由TiC、TiOF2、TiNi和Ti2Ni化学结构组成的复合成分,改善了接头的化学键。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Interfacial enhancement of laser welded joint between Ti-6Al-4V and CFRTP by pre-constructing composite deposition layer
A Ni-PEEK composite layer was prepared on the surface of Ti-6Al-4V by electro-chemical deposition process to improve the interface structures of laser joint between the treated Ti-6Al-4V and CFRTP. The interfacial structures were investigated and the formation mechanism of the joint was figured out as well. The results showed that a stable joint was obtained and the shear strength of the joint reached to 141.7 N/mm. Three kinds of ‘Pinned’ structures were formed between the composite layer and CFRTP as the decomposed or melted or PEEK particles inserted at layer provided advantageous conditions for interfacial joining. Then the intense chemical reactions were occurred at interface and the titanium atoms were found to react with carbon atoms from CFRTP and Ni layer directly. As a result, complex compositions consisting of TiC, TiOF2, TiNi and Ti2Ni chemical structures were generated at interface to improve the chemical bonds of the joint.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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