Junjie Li , Yanyan Yuan , Jiaoling Zhao , Yuchun Tu , Hu Wang , Yun Cui , Rong Huang , Kui Yi
{"title":"探索CH4气体对Mo/B4C多层膜结晶行为和界面结构的影响:薄膜工程的新方法","authors":"Junjie Li , Yanyan Yuan , Jiaoling Zhao , Yuchun Tu , Hu Wang , Yun Cui , Rong Huang , Kui Yi","doi":"10.1016/j.matchar.2025.115197","DOIUrl":null,"url":null,"abstract":"<div><div>Interface structure and crystallization behavior play an important role in the reflectivity of multilayer mirrors. In this study, Mo/B<sub>4</sub>C multilayers were prepared by magnetron sputtering technology with the introduction of CH<sub>4</sub> gases to investigate crystallization behavior, interface diffusion, as well as interface roughness. The results indicate that the introduction of CH<sub>4</sub> gases reduced the crystallinity of the Mo layers to some extent and altered the phase composition. All samples possessed a well-defined periodic structure. The Mo layer was primarily in a microcrystalline or amorphous state, thereby effectively reducing the interface roughness of the multilayer film. Additionally, with the introduction of CH<sub>4</sub> gases, an interlayer of molybdenum carbide was formed at the B<sub>4</sub>C-on-Mo interface, effectively preventing interface diffusion between the layers.</div></div>","PeriodicalId":18727,"journal":{"name":"Materials Characterization","volume":"225 ","pages":"Article 115197"},"PeriodicalIF":4.8000,"publicationDate":"2025-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Exploring the impact of CH4 gas on crystallization behavior and interfacial structure in Mo/B4C multilayer films: A novel approach to thin-film engineering\",\"authors\":\"Junjie Li , Yanyan Yuan , Jiaoling Zhao , Yuchun Tu , Hu Wang , Yun Cui , Rong Huang , Kui Yi\",\"doi\":\"10.1016/j.matchar.2025.115197\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Interface structure and crystallization behavior play an important role in the reflectivity of multilayer mirrors. In this study, Mo/B<sub>4</sub>C multilayers were prepared by magnetron sputtering technology with the introduction of CH<sub>4</sub> gases to investigate crystallization behavior, interface diffusion, as well as interface roughness. The results indicate that the introduction of CH<sub>4</sub> gases reduced the crystallinity of the Mo layers to some extent and altered the phase composition. All samples possessed a well-defined periodic structure. The Mo layer was primarily in a microcrystalline or amorphous state, thereby effectively reducing the interface roughness of the multilayer film. Additionally, with the introduction of CH<sub>4</sub> gases, an interlayer of molybdenum carbide was formed at the B<sub>4</sub>C-on-Mo interface, effectively preventing interface diffusion between the layers.</div></div>\",\"PeriodicalId\":18727,\"journal\":{\"name\":\"Materials Characterization\",\"volume\":\"225 \",\"pages\":\"Article 115197\"},\"PeriodicalIF\":4.8000,\"publicationDate\":\"2025-05-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Characterization\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1044580325004863\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, CHARACTERIZATION & TESTING\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Characterization","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1044580325004863","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, CHARACTERIZATION & TESTING","Score":null,"Total":0}
Exploring the impact of CH4 gas on crystallization behavior and interfacial structure in Mo/B4C multilayer films: A novel approach to thin-film engineering
Interface structure and crystallization behavior play an important role in the reflectivity of multilayer mirrors. In this study, Mo/B4C multilayers were prepared by magnetron sputtering technology with the introduction of CH4 gases to investigate crystallization behavior, interface diffusion, as well as interface roughness. The results indicate that the introduction of CH4 gases reduced the crystallinity of the Mo layers to some extent and altered the phase composition. All samples possessed a well-defined periodic structure. The Mo layer was primarily in a microcrystalline or amorphous state, thereby effectively reducing the interface roughness of the multilayer film. Additionally, with the introduction of CH4 gases, an interlayer of molybdenum carbide was formed at the B4C-on-Mo interface, effectively preventing interface diffusion between the layers.
期刊介绍:
Materials Characterization features original articles and state-of-the-art reviews on theoretical and practical aspects of the structure and behaviour of materials.
The Journal focuses on all characterization techniques, including all forms of microscopy (light, electron, acoustic, etc.,) and analysis (especially microanalysis and surface analytical techniques). Developments in both this wide range of techniques and their application to the quantification of the microstructure of materials are essential facets of the Journal.
The Journal provides the Materials Scientist/Engineer with up-to-date information on many types of materials with an underlying theme of explaining the behavior of materials using novel approaches. Materials covered by the journal include:
Metals & Alloys
Ceramics
Nanomaterials
Biomedical materials
Optical materials
Composites
Natural Materials.