{"title":"Sn-58Bi焊料与p型(Bi,Sb)2Te3和n型Bi2(Te,Se)3热电材料的界面反应及生长动力学","authors":"Chao-hong Wang, Chun-wei Chiu","doi":"10.1007/s10854-025-14901-0","DOIUrl":null,"url":null,"abstract":"<div><p>Bi<sub>2</sub>Te<sub>3</sub>-based alloys, including p-type (Bi,Sb)<sub>2</sub>Te<sub>3</sub> and n-type Bi<sub>2</sub>(Te,Se)<sub>3</sub>, are the most widely used thermoelectric (TE) materials. Eutectic Sn-58 wt.%Bi solder is commonly employed for assembling p-n pairs in commercial TE modules. This study systematically investigates the interfacial reactions of Sn-58Bi solder with p-type and n-type TE substrates under various temperatures and aging durations. In addition, the growth kinetics of intermetallic compounds (IMCs) are analyzed to better understand the interfacial behavior. In the liquid-state reaction with p-type (Bi,Sb)<sub>2</sub>Te<sub>3</sub>, the formed SnTe phase exhibited a porous microstructure composed of fine grains. Notably, the IMC growth followed a linear relationship with aging time, indicating a reaction-limited growth mechanism. The porous structure likely facilitated the rapid diffusion of Sn through the SnTe layer, thereby reducing diffusion resistance and accelerating the interfacial reaction. In the solid-state reactions with (Bi,Sb)<sub>2</sub>Te<sub>3</sub>, the dense SnTe phase gradually thickened with aging time, exhibiting diffusion-controlled parabolic growth behavior. Prolonged aging cause substantial Sn depletion from the solder, leading to the accumulation of a thick Bi layer at the interface. In both liquid-state and solid-state reactions with n-type Bi<sub>2</sub>(Te,Se)<sub>3</sub>, the SnTe phase and an underlying thin BiTe layer formed simultaneously. Notably, the formation of these IMC phases was significantly suppressed compared to those observed in reactions with p-type (Bi,Sb)<sub>2</sub>Te<sub>3</sub>. In both cases, the IMCs exhibited diffusion-controlled growth behavior. The corresponding growth kinetics parameters, including activation energies and growth rate constants, were also determined.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"36 14","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Interfacial reactions and growth kinetics of Sn-58Bi solder with p-type (Bi,Sb)2Te3 and n-type Bi2(Te,Se)3 thermoelectric materials\",\"authors\":\"Chao-hong Wang, Chun-wei Chiu\",\"doi\":\"10.1007/s10854-025-14901-0\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Bi<sub>2</sub>Te<sub>3</sub>-based alloys, including p-type (Bi,Sb)<sub>2</sub>Te<sub>3</sub> and n-type Bi<sub>2</sub>(Te,Se)<sub>3</sub>, are the most widely used thermoelectric (TE) materials. Eutectic Sn-58 wt.%Bi solder is commonly employed for assembling p-n pairs in commercial TE modules. This study systematically investigates the interfacial reactions of Sn-58Bi solder with p-type and n-type TE substrates under various temperatures and aging durations. In addition, the growth kinetics of intermetallic compounds (IMCs) are analyzed to better understand the interfacial behavior. In the liquid-state reaction with p-type (Bi,Sb)<sub>2</sub>Te<sub>3</sub>, the formed SnTe phase exhibited a porous microstructure composed of fine grains. Notably, the IMC growth followed a linear relationship with aging time, indicating a reaction-limited growth mechanism. The porous structure likely facilitated the rapid diffusion of Sn through the SnTe layer, thereby reducing diffusion resistance and accelerating the interfacial reaction. In the solid-state reactions with (Bi,Sb)<sub>2</sub>Te<sub>3</sub>, the dense SnTe phase gradually thickened with aging time, exhibiting diffusion-controlled parabolic growth behavior. Prolonged aging cause substantial Sn depletion from the solder, leading to the accumulation of a thick Bi layer at the interface. In both liquid-state and solid-state reactions with n-type Bi<sub>2</sub>(Te,Se)<sub>3</sub>, the SnTe phase and an underlying thin BiTe layer formed simultaneously. Notably, the formation of these IMC phases was significantly suppressed compared to those observed in reactions with p-type (Bi,Sb)<sub>2</sub>Te<sub>3</sub>. In both cases, the IMCs exhibited diffusion-controlled growth behavior. The corresponding growth kinetics parameters, including activation energies and growth rate constants, were also determined.</p></div>\",\"PeriodicalId\":646,\"journal\":{\"name\":\"Journal of Materials Science: Materials in Electronics\",\"volume\":\"36 14\",\"pages\":\"\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2025-05-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Science: Materials in Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10854-025-14901-0\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-025-14901-0","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Interfacial reactions and growth kinetics of Sn-58Bi solder with p-type (Bi,Sb)2Te3 and n-type Bi2(Te,Se)3 thermoelectric materials
Bi2Te3-based alloys, including p-type (Bi,Sb)2Te3 and n-type Bi2(Te,Se)3, are the most widely used thermoelectric (TE) materials. Eutectic Sn-58 wt.%Bi solder is commonly employed for assembling p-n pairs in commercial TE modules. This study systematically investigates the interfacial reactions of Sn-58Bi solder with p-type and n-type TE substrates under various temperatures and aging durations. In addition, the growth kinetics of intermetallic compounds (IMCs) are analyzed to better understand the interfacial behavior. In the liquid-state reaction with p-type (Bi,Sb)2Te3, the formed SnTe phase exhibited a porous microstructure composed of fine grains. Notably, the IMC growth followed a linear relationship with aging time, indicating a reaction-limited growth mechanism. The porous structure likely facilitated the rapid diffusion of Sn through the SnTe layer, thereby reducing diffusion resistance and accelerating the interfacial reaction. In the solid-state reactions with (Bi,Sb)2Te3, the dense SnTe phase gradually thickened with aging time, exhibiting diffusion-controlled parabolic growth behavior. Prolonged aging cause substantial Sn depletion from the solder, leading to the accumulation of a thick Bi layer at the interface. In both liquid-state and solid-state reactions with n-type Bi2(Te,Se)3, the SnTe phase and an underlying thin BiTe layer formed simultaneously. Notably, the formation of these IMC phases was significantly suppressed compared to those observed in reactions with p-type (Bi,Sb)2Te3. In both cases, the IMCs exhibited diffusion-controlled growth behavior. The corresponding growth kinetics parameters, including activation energies and growth rate constants, were also determined.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.