Sn-58Bi焊料与p型(Bi,Sb)2Te3和n型Bi2(Te,Se)3热电材料的界面反应及生长动力学

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Chao-hong Wang, Chun-wei Chiu
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引用次数: 0

摘要

bi2te3基合金包括p型(Bi,Sb)2Te3和n型Bi2(Te,Se)3,是应用最广泛的热电(Te)材料。共晶Sn-58 wt.%Bi焊料通常用于在商用TE模块中组装p-n对。本研究系统地研究了Sn-58Bi焊料在不同温度和时效时间下与p型和n型TE衬底的界面反应。此外,还分析了金属间化合物(IMCs)的生长动力学,以更好地了解其界面行为。在与p型(Bi,Sb)2Te3的液相反应中,形成的SnTe相呈现出由细晶粒组成的多孔微观结构。值得注意的是,IMC的生长与时效时间呈线性关系,表明其生长机制是反应受限的。多孔结构可能促进了Sn在SnTe层中的快速扩散,从而降低了扩散阻力,加速了界面反应。在与(Bi,Sb)2Te3的固相反应中,致密的SnTe相随着时效时间的延长逐渐增厚,呈现出扩散控制的抛物线型生长行为。长时间的时效导致焊料锡的大量损耗,导致在界面处积累了一层厚的铋层。在与n型Bi2(Te,Se)3的液相和固相反应中,SnTe相和其下的薄薄的BiTe层同时形成。值得注意的是,与p型(Bi,Sb)2Te3反应相比,这些IMC相的形成明显受到抑制。在这两种情况下,IMCs都表现出扩散控制的生长行为。并确定了相应的生长动力学参数,包括活化能和生长速率常数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Interfacial reactions and growth kinetics of Sn-58Bi solder with p-type (Bi,Sb)2Te3 and n-type Bi2(Te,Se)3 thermoelectric materials

Bi2Te3-based alloys, including p-type (Bi,Sb)2Te3 and n-type Bi2(Te,Se)3, are the most widely used thermoelectric (TE) materials. Eutectic Sn-58 wt.%Bi solder is commonly employed for assembling p-n pairs in commercial TE modules. This study systematically investigates the interfacial reactions of Sn-58Bi solder with p-type and n-type TE substrates under various temperatures and aging durations. In addition, the growth kinetics of intermetallic compounds (IMCs) are analyzed to better understand the interfacial behavior. In the liquid-state reaction with p-type (Bi,Sb)2Te3, the formed SnTe phase exhibited a porous microstructure composed of fine grains. Notably, the IMC growth followed a linear relationship with aging time, indicating a reaction-limited growth mechanism. The porous structure likely facilitated the rapid diffusion of Sn through the SnTe layer, thereby reducing diffusion resistance and accelerating the interfacial reaction. In the solid-state reactions with (Bi,Sb)2Te3, the dense SnTe phase gradually thickened with aging time, exhibiting diffusion-controlled parabolic growth behavior. Prolonged aging cause substantial Sn depletion from the solder, leading to the accumulation of a thick Bi layer at the interface. In both liquid-state and solid-state reactions with n-type Bi2(Te,Se)3, the SnTe phase and an underlying thin BiTe layer formed simultaneously. Notably, the formation of these IMC phases was significantly suppressed compared to those observed in reactions with p-type (Bi,Sb)2Te3. In both cases, the IMCs exhibited diffusion-controlled growth behavior. The corresponding growth kinetics parameters, including activation energies and growth rate constants, were also determined.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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