Meng Li, Qian Cai, Wenting Hong, Xu He and Wei Liu
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引用次数: 0
摘要
基于二维(2D)材料的光电探测器通过实现高灵敏度、超快响应和宽带检测,正在彻底改变光电子学。然而,独立的2D材料通常存在高暗电流、慢响应时间和有限的光吸收等问题。在这里,我们展示了一种基于Sb2Te3/MoSe2范德华(vdW)异质结的高性能光电探测器,利用Sb2Te3的拓扑保护表面态和MoSe2的强光吸收。异质结界面处的内置电场增强了电荷分离,抑制了复合,并显著降低了暗电流。实验结果表明,该器件具有5.14 × 1012 Jones的高探测率、178 a W−1的光响应率,以及1v偏置下532 nm光照下110 μs(上升)和230 μs(下降)的快速响应时间。此外,异质结可以实现532至1550 nm的宽带光探测,使其适合于光通信和传感应用。这项工作为拓扑绝缘体与过渡金属二硫族化合物(TMDs)的集成提供了新的见解,以实现具有优越性能的下一代光电器件。
Two-dimensional Sb2Te3/MoSe2 van der Waals heterojunction for high-sensitivity photodetectors†
Photodetectors based on two-dimensional (2D) materials are revolutionizing optoelectronics by enabling high sensitivity, ultrafast response, and broadband detection. However, standalone 2D materials often suffer from high dark current, slow response times, and limited light absorption. Here, we demonstrate a high-performance photodetector based on a Sb2Te3/MoSe2 van der Waals (vdW) heterojunction, leveraging the topologically protected surface states of Sb2Te3 and the strong light absorption of MoSe2. The built-in electric field at the heterojunction interface enhances charge separation, suppresses recombination, and significantly reduces dark current. As a result, the device exhibits a high detectivity of 5.14 × 1012 Jones, an exceptional photoresponsivity of 178 A W−1, and fast response times of 110 μs (rise) and 230 μs (fall) under 532 nm illumination at 1 V bias. Additionally, the heterojunction enables broadband photodetection spanning 532 to 1550 nm, making it suitable for optical communication and sensing applications. This work provides new insights into the integration of topological insulators with transition metal dichalcogenides (TMDs) to achieve next-generation optoelectronic devices with superior performance.