Zebin Xia, Peng Lyu, Ze Liu, Jiyu Pan, Fengzhou Fang
{"title":"镍磷合金的环保化学机械抛光研究","authors":"Zebin Xia, Peng Lyu, Ze Liu, Jiyu Pan, Fengzhou Fang","doi":"10.1016/j.precisioneng.2025.05.008","DOIUrl":null,"url":null,"abstract":"<div><div>Cutting marks on nickel–phosphorus (NiP) coating surfaces can cause diffraction and stray light, negatively affecting the quality of the workpiece. Drawing on the chemical mechanical polishing mechanism, malic acid, an environmentally friendly organic acid, is used to prepare the polishing solution instead of a strong acid. Then, the optimal formulation of the polishing solution is identified to effectively remove the cutting marks. Using the proposed environmentally friendly polishing solution with the optimal formulation, the NiP coating surface is polished to obtain a surface roughness below 0.3 nm in Sa. Analysis using X-ray photoelectron spectroscopy indicates that H<sub>2</sub>O<sub>2</sub> oxidizes the NiP coating surfaces, while malic acid maintains the acidity of the solution and enhances polishing efficiency. Orthogonal experiments are conducted to optimize the polishing parameters, resulting in a surface roughness of 0.26 nm (Sa) on the NiP coating.</div></div>","PeriodicalId":54589,"journal":{"name":"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology","volume":"95 ","pages":"Pages 423-435"},"PeriodicalIF":3.7000,"publicationDate":"2025-05-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Study on the eco-friendly chemical mechanical polishing of nickel–phosphorus alloy\",\"authors\":\"Zebin Xia, Peng Lyu, Ze Liu, Jiyu Pan, Fengzhou Fang\",\"doi\":\"10.1016/j.precisioneng.2025.05.008\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Cutting marks on nickel–phosphorus (NiP) coating surfaces can cause diffraction and stray light, negatively affecting the quality of the workpiece. Drawing on the chemical mechanical polishing mechanism, malic acid, an environmentally friendly organic acid, is used to prepare the polishing solution instead of a strong acid. Then, the optimal formulation of the polishing solution is identified to effectively remove the cutting marks. Using the proposed environmentally friendly polishing solution with the optimal formulation, the NiP coating surface is polished to obtain a surface roughness below 0.3 nm in Sa. Analysis using X-ray photoelectron spectroscopy indicates that H<sub>2</sub>O<sub>2</sub> oxidizes the NiP coating surfaces, while malic acid maintains the acidity of the solution and enhances polishing efficiency. Orthogonal experiments are conducted to optimize the polishing parameters, resulting in a surface roughness of 0.26 nm (Sa) on the NiP coating.</div></div>\",\"PeriodicalId\":54589,\"journal\":{\"name\":\"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology\",\"volume\":\"95 \",\"pages\":\"Pages 423-435\"},\"PeriodicalIF\":3.7000,\"publicationDate\":\"2025-05-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S014163592500159X\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, MANUFACTURING\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S014163592500159X","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
Study on the eco-friendly chemical mechanical polishing of nickel–phosphorus alloy
Cutting marks on nickel–phosphorus (NiP) coating surfaces can cause diffraction and stray light, negatively affecting the quality of the workpiece. Drawing on the chemical mechanical polishing mechanism, malic acid, an environmentally friendly organic acid, is used to prepare the polishing solution instead of a strong acid. Then, the optimal formulation of the polishing solution is identified to effectively remove the cutting marks. Using the proposed environmentally friendly polishing solution with the optimal formulation, the NiP coating surface is polished to obtain a surface roughness below 0.3 nm in Sa. Analysis using X-ray photoelectron spectroscopy indicates that H2O2 oxidizes the NiP coating surfaces, while malic acid maintains the acidity of the solution and enhances polishing efficiency. Orthogonal experiments are conducted to optimize the polishing parameters, resulting in a surface roughness of 0.26 nm (Sa) on the NiP coating.
期刊介绍:
Precision Engineering - Journal of the International Societies for Precision Engineering and Nanotechnology is devoted to the multidisciplinary study and practice of high accuracy engineering, metrology, and manufacturing. The journal takes an integrated approach to all subjects related to research, design, manufacture, performance validation, and application of high precision machines, instruments, and components, including fundamental and applied research and development in manufacturing processes, fabrication technology, and advanced measurement science. The scope includes precision-engineered systems and supporting metrology over the full range of length scales, from atom-based nanotechnology and advanced lithographic technology to large-scale systems, including optical and radio telescopes and macrometrology.