{"title":"极紫外技术在高分子功能化中的应用","authors":"Di Qu, Minglei Wang, Léonard Bezinge, Celine Hensky, Filippo Longo, Claudia Masucci, Mirushe Suloska, Jing Wang, Davide Bleiner","doi":"10.1002/hlca.202400100","DOIUrl":null,"url":null,"abstract":"<p>Extreme ultraviolet (XUV) radiation is highly efficient for functionalization of solid materials by means of pronounced radical formation. To prevent collective effects, and study single photon effects, a low-fluence XUV source with 200 μJ/cm<sup>2</sup> was used to irradiate polymers such as poly-methyl methacrylate (PMMA) and poly-tetrafluoroethylene (PTFE). The unexposed and XUV-exposed sample domains were analyzed with time-of-flight secondary ion mass spectrometry (TOF-SIMS), Fourier transform infrared spectroscopy (FT-IR), and X-ray photoelectron spectroscopy (XPS). The findings show that XUV photons drive photochemical modification of the surface, fragmentation, and ionization of the desorbed products. Besides a theoretical analysis, the XUV-induced surface modification of PTFE is discussed a new application for surface functionalization.</p>","PeriodicalId":12842,"journal":{"name":"Helvetica Chimica Acta","volume":"108 5","pages":""},"PeriodicalIF":1.5000,"publicationDate":"2025-04-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Efficient Polymer Functionalization by Means of Extreme Ultraviolet\",\"authors\":\"Di Qu, Minglei Wang, Léonard Bezinge, Celine Hensky, Filippo Longo, Claudia Masucci, Mirushe Suloska, Jing Wang, Davide Bleiner\",\"doi\":\"10.1002/hlca.202400100\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>Extreme ultraviolet (XUV) radiation is highly efficient for functionalization of solid materials by means of pronounced radical formation. To prevent collective effects, and study single photon effects, a low-fluence XUV source with 200 μJ/cm<sup>2</sup> was used to irradiate polymers such as poly-methyl methacrylate (PMMA) and poly-tetrafluoroethylene (PTFE). The unexposed and XUV-exposed sample domains were analyzed with time-of-flight secondary ion mass spectrometry (TOF-SIMS), Fourier transform infrared spectroscopy (FT-IR), and X-ray photoelectron spectroscopy (XPS). The findings show that XUV photons drive photochemical modification of the surface, fragmentation, and ionization of the desorbed products. Besides a theoretical analysis, the XUV-induced surface modification of PTFE is discussed a new application for surface functionalization.</p>\",\"PeriodicalId\":12842,\"journal\":{\"name\":\"Helvetica Chimica Acta\",\"volume\":\"108 5\",\"pages\":\"\"},\"PeriodicalIF\":1.5000,\"publicationDate\":\"2025-04-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Helvetica Chimica Acta\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/hlca.202400100\",\"RegionNum\":4,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Helvetica Chimica Acta","FirstCategoryId":"92","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/hlca.202400100","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
Efficient Polymer Functionalization by Means of Extreme Ultraviolet
Extreme ultraviolet (XUV) radiation is highly efficient for functionalization of solid materials by means of pronounced radical formation. To prevent collective effects, and study single photon effects, a low-fluence XUV source with 200 μJ/cm2 was used to irradiate polymers such as poly-methyl methacrylate (PMMA) and poly-tetrafluoroethylene (PTFE). The unexposed and XUV-exposed sample domains were analyzed with time-of-flight secondary ion mass spectrometry (TOF-SIMS), Fourier transform infrared spectroscopy (FT-IR), and X-ray photoelectron spectroscopy (XPS). The findings show that XUV photons drive photochemical modification of the surface, fragmentation, and ionization of the desorbed products. Besides a theoretical analysis, the XUV-induced surface modification of PTFE is discussed a new application for surface functionalization.
期刊介绍：
Helvetica Chimica Acta, founded by the Swiss Chemical Society in 1917, is a monthly multidisciplinary journal dedicated to the dissemination of knowledge in all disciplines of chemistry (organic, inorganic, physical, technical, theoretical and analytical chemistry) as well as research at the interface with other sciences, where molecular aspects are key to the findings. Helvetica Chimica Acta is committed to the publication of original, high quality papers at the frontier of scientific research. All contributions will be peer reviewed with the highest possible standards and published within 3 months of receipt, with no restriction on the length of the papers and in full color.
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