带电粒子系统库仑相互作用估计的准射线追踪方法。

IF 2.9 4区 工程技术 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Mingkang Wang, Weiming Ren, Zizhou Gong
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引用次数: 0

摘要

库仑相互作用(CI)是导致带电粒子成像系统分辨率下降的一个重要因素。例如,扫描电子显微镜(SEM)的某些检测应用需要高探针电流,这加剧了由于CI导致的分辨率下降。然而,目前估计CI的方法,如直接射线追踪和分析方法,难以平衡速度和准确性。这一限制极大地阻碍了SEM设计参数的有效优化。在这项研究中,我们提出了一种基于微扰理论的准射线追踪方法,该方法利用蒙特卡罗射线追踪方法模拟了ci诱导的轨迹位移和Boersch效应。我们的方法消除了传统直接射线追踪中使用迭代求解器的需要,从而将模拟速度提高了105倍以上。对直接射线追踪方法的基准测试表明,在覆盖典型SEM应用的广泛参数范围内,误差范围小于1%。这种准射线追踪方法为带电粒子成像系统中的CI估计提供了一种快速、准确和通用的解决方案。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quasi-ray Tracing Method for Coulomb Interaction Estimation in Charged Particle Systems.

Coulomb interaction (CI) is a crucial factor contributing to the degradation of resolution in charged particle imaging systems. For example, certain inspection applications of scanning electron microscopes (SEM) require high probe current, which exacerbates resolution degradation due to CI. However, current methods for estimating CI, such as direct ray tracing and analytical approaches, struggle to balance speed and accuracy. This limitation significantly impedes the efficient optimization of SEM design parameters. In this study, we propose a quasi-ray tracing method based on perturbation theory, which simulates CI-induced trajectory displacement and the Boersch effect using a Monte Carlo ray tracing approach. Our method eliminates the need for iterative solvers employed in conventional direct ray tracing, thereby increasing simulation speed by over 105 times. Benchmarking against the direct ray tracing method demonstrates an error margin of less than 1% over a broad parameter range covering typical SEM applications. This quasi-ray tracing approach offers a fast, accurate, and general solution for CI estimation in charged particle imaging systems.

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来源期刊
Microscopy and Microanalysis
Microscopy and Microanalysis 工程技术-材料科学:综合
CiteScore
1.10
自引率
10.70%
发文量
1391
审稿时长
6 months
期刊介绍: Microscopy and Microanalysis publishes original research papers in the fields of microscopy, imaging, and compositional analysis. This distinguished international forum is intended for microscopists in both biology and materials science. The journal provides significant articles that describe new and existing techniques and instrumentation, as well as the applications of these to the imaging and analysis of microstructure. Microscopy and Microanalysis also includes review articles, letters to the editor, and book reviews.
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