利用pt -硅氧化物IDT改进高温TCF的SAW传感器的设计与优化

IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Aditya Kumar Nagmani, Basudeba Behera
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引用次数: 0

摘要

本文研究了在(0°,138.5°,26.6°)切割的langasite (LGS)衬底上设计SiO2薄膜的两种传统结构和四种新型结构。并与不含SiO2薄膜的langasite谐振腔进行了比较。使用三维有限元建模方法,在高达600°C的高温下研究了所有的langasite结构。优化后的结构在工作温度范围内具有最低的温度频率系数(TCF)和高耦合系数(k2)。优化后的结构可将室温下的TCF降低至2.52 ppm/°C,在600℃下的高温下可降低至13.78 ppm/°C。与传统结构相比,优化后的结构在室温下的耦合系数提高了0.05%。因此,可以选择系统优化的结构来实现可在高温下工作的温度传感器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design and Optimization of a SAW Sensor With Improved TCF at High Temperatures Using Pt-Silicon Oxide IDT

This paper investigates two conventional and four proposed structures designed by patterning the SiO2 film over the (0°, 138.5°, 26.6°) cut langasite (LGS) substrate. The results are compared with those obtained with a langasite resonator designed without the SiO2 film. All langasite structures are investigated at elevated temperatures up to 600°C using a 3-D finite element modeling method. The proposed structures are optimized for the lowest temperature coefficient of frequency (TCF) and high coupling factor (k2) as a function of SiO2 film thickness for the operating temperature range. The optimized structure reduces the TCF to 2.52 ppm/°C at room temperature and for high temperatures to as low as 13.78 ppm/°C at 600°C. An enhanced coupling factor of 0.05% is obtained for the optimized structure at room temperature compared to the conventional structures. Thus, the systematically optimized structure may be selected to realize a temperature sensor that can perform at elevated temperatures.

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来源期刊
CiteScore
4.60
自引率
6.20%
发文量
101
审稿时长
>12 weeks
期刊介绍: Prediction through modelling forms the basis of engineering design. The computational power at the fingertips of the professional engineer is increasing enormously and techniques for computer simulation are changing rapidly. Engineers need models which relate to their design area and which are adaptable to new design concepts. They also need efficient and friendly ways of presenting, viewing and transmitting the data associated with their models. The International Journal of Numerical Modelling: Electronic Networks, Devices and Fields provides a communication vehicle for numerical modelling methods and data preparation methods associated with electrical and electronic circuits and fields. It concentrates on numerical modelling rather than abstract numerical mathematics. Contributions on numerical modelling will cover the entire subject of electrical and electronic engineering. They will range from electrical distribution networks to integrated circuits on VLSI design, and from static electric and magnetic fields through microwaves to optical design. They will also include the use of electrical networks as a modelling medium.
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