阿斯巴甜赋予zno基自修复固体电解质界面膜用于长循环宽温水溶液锌离子电池。

IF 36.3 1区 材料科学 Q1 Engineering
Yunyu Shi, Yingkang Liu, Ruirui Chang, Guilin Zhang, Yuqing Rang, Zheng-Long Xu, Qi Meng, Penghui Cao, Xiangyang Zhou, Jingjing Tang, Juan Yang
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引用次数: 0

摘要

金属锌阳极在水溶液中发生析氢和枝晶沉积,导致水溶液锌离子电池的库仑效率低,循环稳定性差。构建对锌具有强亲和力的稳定的固体电解质界面相(SEI)并防止锌金属阳极的水腐蚀是解决这些挑战的一个很有希望的策略。在这项研究中,我们利用阿斯巴甜(APM)作为多功能电解质添加剂,在锌电极表面开发了一种自修复的zno基SEI膜。APM的疏水性和强Zn亲和性有利于zno基SEI膜在循环镀锌/剥离过程中的动态自愈。受益于自修复zno基SEI的卓越保护效果,即使在1 mA cm-2 - 1 mAh cm-2的低电流密度下,Zn - Cu电池在1000次循环中的平均库仑效率也超过99.59%。此外,锌NH4+-V2O5电池具有150 mAh g-1的大比容量和高循环稳定性,经过1750次循环后容量保持率为77.8%。此外,即使在高达85.2%的DOD下,Zn - Zn电池也能在- 5至40°C的宽温度范围内提供高温适应性。增强的性能和耐久性源于多功能APM添加剂的自修复SEI形成,这些添加剂既能抑制腐蚀,又能稳定界面。这项工作提出了一种启发和直接的方法来促进无枝晶和宽温度可充电的azib储能系统。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Aspartame Endowed ZnO-Based Self-Healing Solid Electrolyte Interface Film for Long-Cycling and Wide-Temperature Aqueous Zn-Ion Batteries

Highlights

  • Aspartame additive in electrolyte enables the in situ formation of ZnO-based solid electrolyte interphase, enhancing Zn anode corrosion resistance and stability with excellent self-healing capabilities.

  • Zn║Zn symmetric cells with APM-modified electrolyte operate stably for 6,400 h at − 5 °C, 10,330 h at 25 °C, and 2,250 h at 40 °C, with a high DOD of 85.2%.

  • Achieves 99.59% Coulombic efficiency, suppresses dendrite growth, and maintains 150 mAh g−1 capacity after 1,750 cycles in NH4+-V2O5 full cells.

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来源期刊
Nano-Micro Letters
Nano-Micro Letters NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
32.60
自引率
4.90%
发文量
981
审稿时长
1.1 months
期刊介绍: Nano-Micro Letters is a peer-reviewed, international, interdisciplinary, and open-access journal published under the SpringerOpen brand. Nano-Micro Letters focuses on the science, experiments, engineering, technologies, and applications of nano- or microscale structures and systems in various fields such as physics, chemistry, biology, material science, and pharmacy.It also explores the expanding interfaces between these fields. Nano-Micro Letters particularly emphasizes the bottom-up approach in the length scale from nano to micro. This approach is crucial for achieving industrial applications in nanotechnology, as it involves the assembly, modification, and control of nanostructures on a microscale.
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