O. Hernandez-Rodriguez , G. Guzman , R. Ortiz , E. Zuza , V. Bellido-Gonzalez , I. Quintana , E. G-Berasategui
{"title":"基于oes的反应磁控溅射氧化钨电致变色涂层工艺优化控制方法","authors":"O. Hernandez-Rodriguez , G. Guzman , R. Ortiz , E. Zuza , V. Bellido-Gonzalez , I. Quintana , E. G-Berasategui","doi":"10.1016/j.surfcoat.2025.132239","DOIUrl":null,"url":null,"abstract":"<div><div>This research presents a pioneering study on the correlation between sputtering process parameters, optical emission spectroscopy (OES) process monitoring, and electrochromic properties of WO<sub>x</sub> thin films. The study established a procedure to determine the optimal process configuration to deposit high-performance electrochromic coatings through the monitoring of W emission spectral line. The microstructure, electrochromic properties of WO<sub>x</sub> coatings were evaluated for different sputtering process parameters, varying the applied power and process pressure. The low-pressure and power scenario was found optimum to maximize the performance of the deposited WO<sub>x</sub> coatings. This process configuration resulted in the deposition of rough WO<sub>x</sub> thin films, avoiding crack formation on the coating surface, which strongly affects their electrochromic behavior. In these conditions, WO<sub>x</sub> coatings with an optical modulation of up to 73 % and a colouring efficiency of 34 cm<sup>2</sup>/C were deposited. Real-time OES monitoring improves the control and understanding of the sputtering process, turning out an essential tool for the future digitization of coatings developed by reactive magnetron sputtering. Thus, this methodology provides valuable guidance to improve efficiency by addressing quality control, process optimization and deviation detection in the production of electrochromic devices.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"511 ","pages":"Article 132239"},"PeriodicalIF":5.3000,"publicationDate":"2025-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"OES-based control methodology for process optimization of WOx electrochromic coatings deposited by reactive magnetron sputtering\",\"authors\":\"O. Hernandez-Rodriguez , G. Guzman , R. Ortiz , E. Zuza , V. Bellido-Gonzalez , I. Quintana , E. G-Berasategui\",\"doi\":\"10.1016/j.surfcoat.2025.132239\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This research presents a pioneering study on the correlation between sputtering process parameters, optical emission spectroscopy (OES) process monitoring, and electrochromic properties of WO<sub>x</sub> thin films. The study established a procedure to determine the optimal process configuration to deposit high-performance electrochromic coatings through the monitoring of W emission spectral line. The microstructure, electrochromic properties of WO<sub>x</sub> coatings were evaluated for different sputtering process parameters, varying the applied power and process pressure. The low-pressure and power scenario was found optimum to maximize the performance of the deposited WO<sub>x</sub> coatings. This process configuration resulted in the deposition of rough WO<sub>x</sub> thin films, avoiding crack formation on the coating surface, which strongly affects their electrochromic behavior. In these conditions, WO<sub>x</sub> coatings with an optical modulation of up to 73 % and a colouring efficiency of 34 cm<sup>2</sup>/C were deposited. Real-time OES monitoring improves the control and understanding of the sputtering process, turning out an essential tool for the future digitization of coatings developed by reactive magnetron sputtering. Thus, this methodology provides valuable guidance to improve efficiency by addressing quality control, process optimization and deviation detection in the production of electrochromic devices.</div></div>\",\"PeriodicalId\":22009,\"journal\":{\"name\":\"Surface & Coatings Technology\",\"volume\":\"511 \",\"pages\":\"Article 132239\"},\"PeriodicalIF\":5.3000,\"publicationDate\":\"2025-05-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Surface & Coatings Technology\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0257897225005134\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, COATINGS & FILMS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface & Coatings Technology","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0257897225005134","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
OES-based control methodology for process optimization of WOx electrochromic coatings deposited by reactive magnetron sputtering
This research presents a pioneering study on the correlation between sputtering process parameters, optical emission spectroscopy (OES) process monitoring, and electrochromic properties of WOx thin films. The study established a procedure to determine the optimal process configuration to deposit high-performance electrochromic coatings through the monitoring of W emission spectral line. The microstructure, electrochromic properties of WOx coatings were evaluated for different sputtering process parameters, varying the applied power and process pressure. The low-pressure and power scenario was found optimum to maximize the performance of the deposited WOx coatings. This process configuration resulted in the deposition of rough WOx thin films, avoiding crack formation on the coating surface, which strongly affects their electrochromic behavior. In these conditions, WOx coatings with an optical modulation of up to 73 % and a colouring efficiency of 34 cm2/C were deposited. Real-time OES monitoring improves the control and understanding of the sputtering process, turning out an essential tool for the future digitization of coatings developed by reactive magnetron sputtering. Thus, this methodology provides valuable guidance to improve efficiency by addressing quality control, process optimization and deviation detection in the production of electrochromic devices.
期刊介绍:
Surface and Coatings Technology is an international archival journal publishing scientific papers on significant developments in surface and interface engineering to modify and improve the surface properties of materials for protection in demanding contact conditions or aggressive environments, or for enhanced functional performance. Contributions range from original scientific articles concerned with fundamental and applied aspects of research or direct applications of metallic, inorganic, organic and composite coatings, to invited reviews of current technology in specific areas. Papers submitted to this journal are expected to be in line with the following aspects in processes, and properties/performance:
A. Processes: Physical and chemical vapour deposition techniques, thermal and plasma spraying, surface modification by directed energy techniques such as ion, electron and laser beams, thermo-chemical treatment, wet chemical and electrochemical processes such as plating, sol-gel coating, anodization, plasma electrolytic oxidation, etc., but excluding painting.
B. Properties/performance: friction performance, wear resistance (e.g., abrasion, erosion, fretting, etc), corrosion and oxidation resistance, thermal protection, diffusion resistance, hydrophilicity/hydrophobicity, and properties relevant to smart materials behaviour and enhanced multifunctional performance for environmental, energy and medical applications, but excluding device aspects.