基于oes的反应磁控溅射氧化钨电致变色涂层工艺优化控制方法

IF 5.3 2区 材料科学 Q1 MATERIALS SCIENCE, COATINGS & FILMS
O. Hernandez-Rodriguez , G. Guzman , R. Ortiz , E. Zuza , V. Bellido-Gonzalez , I. Quintana , E. G-Berasategui
{"title":"基于oes的反应磁控溅射氧化钨电致变色涂层工艺优化控制方法","authors":"O. Hernandez-Rodriguez ,&nbsp;G. Guzman ,&nbsp;R. Ortiz ,&nbsp;E. Zuza ,&nbsp;V. Bellido-Gonzalez ,&nbsp;I. Quintana ,&nbsp;E. G-Berasategui","doi":"10.1016/j.surfcoat.2025.132239","DOIUrl":null,"url":null,"abstract":"<div><div>This research presents a pioneering study on the correlation between sputtering process parameters, optical emission spectroscopy (OES) process monitoring, and electrochromic properties of WO<sub>x</sub> thin films. The study established a procedure to determine the optimal process configuration to deposit high-performance electrochromic coatings through the monitoring of W emission spectral line. The microstructure, electrochromic properties of WO<sub>x</sub> coatings were evaluated for different sputtering process parameters, varying the applied power and process pressure. The low-pressure and power scenario was found optimum to maximize the performance of the deposited WO<sub>x</sub> coatings. This process configuration resulted in the deposition of rough WO<sub>x</sub> thin films, avoiding crack formation on the coating surface, which strongly affects their electrochromic behavior. In these conditions, WO<sub>x</sub> coatings with an optical modulation of up to 73 % and a colouring efficiency of 34 cm<sup>2</sup>/C were deposited. Real-time OES monitoring improves the control and understanding of the sputtering process, turning out an essential tool for the future digitization of coatings developed by reactive magnetron sputtering. Thus, this methodology provides valuable guidance to improve efficiency by addressing quality control, process optimization and deviation detection in the production of electrochromic devices.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"511 ","pages":"Article 132239"},"PeriodicalIF":5.3000,"publicationDate":"2025-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"OES-based control methodology for process optimization of WOx electrochromic coatings deposited by reactive magnetron sputtering\",\"authors\":\"O. Hernandez-Rodriguez ,&nbsp;G. Guzman ,&nbsp;R. Ortiz ,&nbsp;E. Zuza ,&nbsp;V. Bellido-Gonzalez ,&nbsp;I. Quintana ,&nbsp;E. G-Berasategui\",\"doi\":\"10.1016/j.surfcoat.2025.132239\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This research presents a pioneering study on the correlation between sputtering process parameters, optical emission spectroscopy (OES) process monitoring, and electrochromic properties of WO<sub>x</sub> thin films. The study established a procedure to determine the optimal process configuration to deposit high-performance electrochromic coatings through the monitoring of W emission spectral line. The microstructure, electrochromic properties of WO<sub>x</sub> coatings were evaluated for different sputtering process parameters, varying the applied power and process pressure. The low-pressure and power scenario was found optimum to maximize the performance of the deposited WO<sub>x</sub> coatings. This process configuration resulted in the deposition of rough WO<sub>x</sub> thin films, avoiding crack formation on the coating surface, which strongly affects their electrochromic behavior. In these conditions, WO<sub>x</sub> coatings with an optical modulation of up to 73 % and a colouring efficiency of 34 cm<sup>2</sup>/C were deposited. Real-time OES monitoring improves the control and understanding of the sputtering process, turning out an essential tool for the future digitization of coatings developed by reactive magnetron sputtering. Thus, this methodology provides valuable guidance to improve efficiency by addressing quality control, process optimization and deviation detection in the production of electrochromic devices.</div></div>\",\"PeriodicalId\":22009,\"journal\":{\"name\":\"Surface & Coatings Technology\",\"volume\":\"511 \",\"pages\":\"Article 132239\"},\"PeriodicalIF\":5.3000,\"publicationDate\":\"2025-05-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Surface & Coatings Technology\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0257897225005134\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, COATINGS & FILMS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface & Coatings Technology","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0257897225005134","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0

摘要

本研究对溅射工艺参数、光学发射光谱(OES)过程监测与WOx薄膜电致变色性能之间的关系进行了开创性的研究。通过对W发射谱线的监测,确定了制备高性能电致变色涂层的最佳工艺配置。在不同的溅射工艺参数、不同的功率和工艺压力下,对WOx涂层的微观结构和电致变色性能进行了研究。在低压和低功率的情况下,可以最大限度地提高涂层的性能。这种工艺配置导致了粗糙的WOx薄膜的沉积,避免了涂层表面的裂纹形成,这强烈影响了它们的电致变色行为。在这些条件下,沉积的WOx涂层具有高达73%的光学调制和34 cm2/C的着色效率。OES实时监测提高了对溅射过程的控制和理解,是反应磁控溅射涂层未来数字化的重要工具。因此,该方法通过解决电致变色器件生产中的质量控制、工艺优化和偏差检测问题,为提高效率提供了有价值的指导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
OES-based control methodology for process optimization of WOx electrochromic coatings deposited by reactive magnetron sputtering
This research presents a pioneering study on the correlation between sputtering process parameters, optical emission spectroscopy (OES) process monitoring, and electrochromic properties of WOx thin films. The study established a procedure to determine the optimal process configuration to deposit high-performance electrochromic coatings through the monitoring of W emission spectral line. The microstructure, electrochromic properties of WOx coatings were evaluated for different sputtering process parameters, varying the applied power and process pressure. The low-pressure and power scenario was found optimum to maximize the performance of the deposited WOx coatings. This process configuration resulted in the deposition of rough WOx thin films, avoiding crack formation on the coating surface, which strongly affects their electrochromic behavior. In these conditions, WOx coatings with an optical modulation of up to 73 % and a colouring efficiency of 34 cm2/C were deposited. Real-time OES monitoring improves the control and understanding of the sputtering process, turning out an essential tool for the future digitization of coatings developed by reactive magnetron sputtering. Thus, this methodology provides valuable guidance to improve efficiency by addressing quality control, process optimization and deviation detection in the production of electrochromic devices.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Surface & Coatings Technology
Surface & Coatings Technology 工程技术-材料科学:膜
CiteScore
10.00
自引率
11.10%
发文量
921
审稿时长
19 days
期刊介绍: Surface and Coatings Technology is an international archival journal publishing scientific papers on significant developments in surface and interface engineering to modify and improve the surface properties of materials for protection in demanding contact conditions or aggressive environments, or for enhanced functional performance. Contributions range from original scientific articles concerned with fundamental and applied aspects of research or direct applications of metallic, inorganic, organic and composite coatings, to invited reviews of current technology in specific areas. Papers submitted to this journal are expected to be in line with the following aspects in processes, and properties/performance: A. Processes: Physical and chemical vapour deposition techniques, thermal and plasma spraying, surface modification by directed energy techniques such as ion, electron and laser beams, thermo-chemical treatment, wet chemical and electrochemical processes such as plating, sol-gel coating, anodization, plasma electrolytic oxidation, etc., but excluding painting. B. Properties/performance: friction performance, wear resistance (e.g., abrasion, erosion, fretting, etc), corrosion and oxidation resistance, thermal protection, diffusion resistance, hydrophilicity/hydrophobicity, and properties relevant to smart materials behaviour and enhanced multifunctional performance for environmental, energy and medical applications, but excluding device aspects.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信