高性能IWO薄膜沉积与新的混合技术的太阳能电池应用

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
En-Naji Zakariae , Bes Alexandre , Carroy Perrine , Haacke Mathias , Lacoste Ana
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引用次数: 0

摘要

透明导电氧化物(TCOs)是太阳能电池技术中必不可少的材料,具有高的光传输和导电性。本文提出了一种新的混合等离子体沉积(HPD)技术,该技术将极低压微波等离子体与直流热蒸发相结合。这种技术还没有被报道过,这里给出第一个结果作为概念的证明。等离子体诊断表明离子能量低于30 eV,显著低于传统溅射,为与敏感基底兼容的新沉积技术提供了一条有前途的途径。沉积的IWO(掺钨氧化铟)薄膜晶粒结晶均匀,可见光透射率大于80%,电阻率为3.21 × 10−4 Ωcm,迁移率为41 cm2 × V-1 × s-1,相应载流子浓度为4.76 × 1020 cm−3。在200℃退火后,薄膜的电阻率略微提高到3.8 × 10−4 Ωcm,而迁移率显著提高到86 cm2 × V-1 × s-1,载流子浓度为1.90 × 1020 cm−3,使得这些薄膜非常适合光伏应用。这些薄膜被集成到硅异质结(SHJ)太阳能电池中作为透明电极。太阳能电池的效率高达23.89%,显示了HPD在提高太阳能电池性能方面的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High performance IWO thin films deposited with a new hybrid technology for solar cell applications
Transparent conductive oxides (TCOs) are essential for solar cell technologies, providing high optical transmission and electrical conductivity. This paper proposes a new Hybrid Plasma Deposition (HPD) technique for TCOs, that combines a very low-pressure microwave plasma and DC thermal evaporation. This technique has not yet been reported and the first results are presented here as a proof of concept. Plasma diagnostic indicates ion energies below 30 eV, significantly lower than those of conventional sputtering, offering a promising route to a new deposition technique compatible with sensitive substrates. The deposited IWO (Tungsten-doped Indium Oxide) films exhibit uniformly crystallized grains, optical transmission greater than 80 % in the visible spectrum, low resistivity of 3.21 × 10−4 Ωcm and mobility of 41 cm2 × V-1 × s-1 with a corresponding carrier concentration of 4.76 × 1020 cm−3. After annealing at 200 °C, the resistivity slightly increased to 3.8 × 10−4 Ωcm, while mobility improved significantly to 86 cm2 × V-1 × s-1, with a carrier concentration of 1.90 × 1020 cm−3 making these films highly suitable for photovoltaic applications. These films were integrated into silicon heterojunction (SHJ) solar cells as transparent electrodes. The solar cells exhibited a high efficiency of 23.89 %, demonstrating the potential of HPD in enhancing solar cell performance.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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