{"title":"高性能IWO薄膜沉积与新的混合技术的太阳能电池应用","authors":"En-Naji Zakariae , Bes Alexandre , Carroy Perrine , Haacke Mathias , Lacoste Ana","doi":"10.1016/j.vacuum.2025.114395","DOIUrl":null,"url":null,"abstract":"<div><div>Transparent conductive oxides (TCOs) are essential for solar cell technologies, providing high optical transmission and electrical conductivity. This paper proposes a new Hybrid Plasma Deposition (HPD) technique for TCOs, that combines a very low-pressure microwave plasma and DC thermal evaporation. This technique has not yet been reported and the first results are presented here as a proof of concept. Plasma diagnostic indicates ion energies below 30 eV, significantly lower than those of conventional sputtering, offering a promising route to a new deposition technique compatible with sensitive substrates. The deposited IWO (Tungsten-doped Indium Oxide) films exhibit uniformly crystallized grains, optical transmission greater than 80 % in the visible spectrum, low resistivity of 3.21 × 10<sup>−4</sup> Ωcm and mobility of 41 cm<sup>2</sup> × V<sup>-1 × s<sup>-1</sup></sup> with a corresponding carrier concentration of 4.76 × 10<sup>20</sup> cm<sup>−3</sup>. After annealing at 200 °C, the resistivity slightly increased to 3.8 × 10<sup>−4</sup> Ωcm, while mobility improved significantly to 86 cm<sup>2</sup> × V<sup>-1</sup> × s<sup>-1</sup>, with a carrier concentration of 1.90 × 10<sup>20</sup> cm<sup>−3</sup> making these films highly suitable for photovoltaic applications. These films were integrated into silicon heterojunction (SHJ) solar cells as transparent electrodes. The solar cells exhibited a high efficiency of 23.89 %, demonstrating the potential of HPD in enhancing solar cell performance.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"239 ","pages":"Article 114395"},"PeriodicalIF":3.8000,"publicationDate":"2025-05-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"High performance IWO thin films deposited with a new hybrid technology for solar cell applications\",\"authors\":\"En-Naji Zakariae , Bes Alexandre , Carroy Perrine , Haacke Mathias , Lacoste Ana\",\"doi\":\"10.1016/j.vacuum.2025.114395\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Transparent conductive oxides (TCOs) are essential for solar cell technologies, providing high optical transmission and electrical conductivity. This paper proposes a new Hybrid Plasma Deposition (HPD) technique for TCOs, that combines a very low-pressure microwave plasma and DC thermal evaporation. This technique has not yet been reported and the first results are presented here as a proof of concept. Plasma diagnostic indicates ion energies below 30 eV, significantly lower than those of conventional sputtering, offering a promising route to a new deposition technique compatible with sensitive substrates. The deposited IWO (Tungsten-doped Indium Oxide) films exhibit uniformly crystallized grains, optical transmission greater than 80 % in the visible spectrum, low resistivity of 3.21 × 10<sup>−4</sup> Ωcm and mobility of 41 cm<sup>2</sup> × V<sup>-1 × s<sup>-1</sup></sup> with a corresponding carrier concentration of 4.76 × 10<sup>20</sup> cm<sup>−3</sup>. After annealing at 200 °C, the resistivity slightly increased to 3.8 × 10<sup>−4</sup> Ωcm, while mobility improved significantly to 86 cm<sup>2</sup> × V<sup>-1</sup> × s<sup>-1</sup>, with a carrier concentration of 1.90 × 10<sup>20</sup> cm<sup>−3</sup> making these films highly suitable for photovoltaic applications. These films were integrated into silicon heterojunction (SHJ) solar cells as transparent electrodes. The solar cells exhibited a high efficiency of 23.89 %, demonstrating the potential of HPD in enhancing solar cell performance.</div></div>\",\"PeriodicalId\":23559,\"journal\":{\"name\":\"Vacuum\",\"volume\":\"239 \",\"pages\":\"Article 114395\"},\"PeriodicalIF\":3.8000,\"publicationDate\":\"2025-05-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Vacuum\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0042207X25003859\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X25003859","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
High performance IWO thin films deposited with a new hybrid technology for solar cell applications
Transparent conductive oxides (TCOs) are essential for solar cell technologies, providing high optical transmission and electrical conductivity. This paper proposes a new Hybrid Plasma Deposition (HPD) technique for TCOs, that combines a very low-pressure microwave plasma and DC thermal evaporation. This technique has not yet been reported and the first results are presented here as a proof of concept. Plasma diagnostic indicates ion energies below 30 eV, significantly lower than those of conventional sputtering, offering a promising route to a new deposition technique compatible with sensitive substrates. The deposited IWO (Tungsten-doped Indium Oxide) films exhibit uniformly crystallized grains, optical transmission greater than 80 % in the visible spectrum, low resistivity of 3.21 × 10−4 Ωcm and mobility of 41 cm2 × V-1 × s-1 with a corresponding carrier concentration of 4.76 × 1020 cm−3. After annealing at 200 °C, the resistivity slightly increased to 3.8 × 10−4 Ωcm, while mobility improved significantly to 86 cm2 × V-1 × s-1, with a carrier concentration of 1.90 × 1020 cm−3 making these films highly suitable for photovoltaic applications. These films were integrated into silicon heterojunction (SHJ) solar cells as transparent electrodes. The solar cells exhibited a high efficiency of 23.89 %, demonstrating the potential of HPD in enhancing solar cell performance.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.