Yajin Dong, Wenyue Liang, Shifeng Qian, Zikun Xia, Zekang Mo, Ning Tan, Yongyue Huang, Ziwang Tuo, Yunyang Gong, Long Wen, Qin Chen
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Near-Infrared Photodetection Using an Epsilon-Near-Zero Trapping Effect in Optimized Indium Tin Oxide Films
This paper investigates the unique optical and electrical properties of indium tin oxide (ITO) materials to achieve hot-carrier-based near-infrared photoelectric conversion utilizing the epsilon-near-zero (ENZ) light-trapping effect. By precisely controlling carrier concentrations via rapid thermal annealing (RTA), we optimized the optical and electronic characteristics of ITO, resulting in tunable ENZ wavelengths ranging from 1370 to 1600 nm as annealing temperatures increased from 400 to 500 °C. We propose a prism-coupled planar Au-ITO-Si stack designed to achieve high light absorption and enhanced photoelectric conversion efficiency by leveraging the ENZ effect. The device demonstrates a distinct photoelectric response with a cutoff wavelength of 1600 nm, and the ENZ effect is evident in the photoelectric response spectrum. A phenomenological model was developed to explain the processes involved in hot carrier (HCs) generation, transport, and emission. This work highlights the tunability of the ENZ wavelength achievable through annealing treatments and explores its potential applications in near-infrared photoelectric conversion through an effective device design.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.