利用epsilon -近零俘获效应在优化的氧化铟锡薄膜中进行近红外光探测

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Yajin Dong, Wenyue Liang, Shifeng Qian, Zikun Xia, Zekang Mo, Ning Tan, Yongyue Huang, Ziwang Tuo, Yunyang Gong, Long Wen, Qin Chen
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引用次数: 0

摘要

本文研究了利用epsilon-near-zero (ENZ)光捕获效应实现基于热载子的近红外光电转换的铟锡氧化物(ITO)材料的独特光学和电学性质。通过快速热退火(RTA)精确控制载流子浓度,我们优化了ITO的光学和电子特性,当退火温度从400°C增加到500°C时,ENZ波长在1370到1600 nm之间可调谐。我们提出了一种棱镜耦合的平面Au-ITO-Si堆叠,旨在通过利用ENZ效应实现高光吸收和提高光电转换效率。该器件的截止波长为1600 nm,具有明显的光电响应,且在光电响应光谱中存在明显的ENZ效应。建立了一个现象学模型来解释热载流子(hc)的产生、传输和排放过程。这项工作强调了ENZ波长可通过退火处理实现的可调性,并通过有效的器件设计探索了其在近红外光电转换中的潜在应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Near-Infrared Photodetection Using an Epsilon-Near-Zero Trapping Effect in Optimized Indium Tin Oxide Films

Near-Infrared Photodetection Using an Epsilon-Near-Zero Trapping Effect in Optimized Indium Tin Oxide Films
This paper investigates the unique optical and electrical properties of indium tin oxide (ITO) materials to achieve hot-carrier-based near-infrared photoelectric conversion utilizing the epsilon-near-zero (ENZ) light-trapping effect. By precisely controlling carrier concentrations via rapid thermal annealing (RTA), we optimized the optical and electronic characteristics of ITO, resulting in tunable ENZ wavelengths ranging from 1370 to 1600 nm as annealing temperatures increased from 400 to 500 °C. We propose a prism-coupled planar Au-ITO-Si stack designed to achieve high light absorption and enhanced photoelectric conversion efficiency by leveraging the ENZ effect. The device demonstrates a distinct photoelectric response with a cutoff wavelength of 1600 nm, and the ENZ effect is evident in the photoelectric response spectrum. A phenomenological model was developed to explain the processes involved in hot carrier (HCs) generation, transport, and emission. This work highlights the tunability of the ENZ wavelength achievable through annealing treatments and explores its potential applications in near-infrared photoelectric conversion through an effective device design.
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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