压力效应下MgO纳米结构的结构、光学和电学研究

Y. Al-Douri, M. Ameri, A. Bouhemadou
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引用次数: 0

摘要

采用脉冲激光沉积法(PLD)在不同氧压下制备了氧化镁纳米结构。采用扫描电子显微镜(SEM)、紫外可见分光光度法(UV-vis)和电学特性对制备的MgO纳米结构进行了表征和分析。晶粒尺寸与压力成反比关系。在不同的压力条件下进行了结构研究,重点研究了MgO纳米结构在50 - 300毫巴压力下的性能。晶粒尺寸从12.5 nm(50毫巴)到3.9 nm(300毫巴)不等。此外,还进行了紫外-可见光学研究,以了解MgO纳米结构在不同压力下的行为。在不同的压力下,透射率在300至1100 nm之间测量,50-300毫巴,在200至300毫巴的压力范围内,透射率超过80%。与透射率相关的带隙研究表明,在200mbar时,带隙表现出直接的带间跃迁,这归因于沉积层的非化学计量。从I-V、J-V、C-V特性、光电流、短路电流、开路电压、光谱响应度和量子效率等方面研究了该材料的电学特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Structural, Optical, and Electrical Investigations of MgO Nanostructure Under the Pressure Effect

Structural, Optical, and Electrical Investigations of MgO Nanostructure Under the Pressure Effect

MgO nanostructure is prepared using pulsed laser deposition (PLD) at different oxygen pressure. The prepared MgO nanostructure is characterized and analyzed by scanning electron microscopy (SEM), UV–visible (UV–vis) spectrophotometry and electrical characteristics, respectively. The correlation between grain size and pressure is inversely. The structural studies are presented in terms of varying pressures, focusing on the properties of MgO nanostructures at pressures ranging from 50 to 300 mbar. The grain size varies from 12.5 nm at 50 mbar to 3.9 nm at 300 mbar. Additionally, UV–vis optical investigations are conducted to understand the behavior of MgO nanostructures under different pressures. Transmittance is measured between 300 and 1100 nm across different pressures, 50–300 mbar to show high transmittance over 80% at pressures ranging from 200 to 300 mbar. The bandgap investigation, which is related to transmittance, reveals that at 200 mbar, the bandgap exhibits a direct inter-band transition, attributed to non-stoichiometry of the deposited layer. The electrical properties are investigated in terms of IV, JV, CV characteristics, photo-current, short circuit current, open circuit voltage, spectral responsivity, and quantum efficiency.

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