含氧硅芯光纤在1mgy γ辐照后的衰减特性

IF 3.3 3区 材料科学 Q3 CHEMISTRY, PHYSICAL
Silicon Pub Date : 2025-03-04 DOI:10.1007/s12633-025-03272-0
Mikhail A. Eronyan, Elizaveta L. Klyuchnikova, Marina K. Tsibinogina, Alexander A. Untilov, Vera E. Sitnikova, Ekaterina Yu Shatskaya
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引用次数: 0

摘要

本研究的目的是研究以缺氧二氧化硅玻璃为芯、掺氟包层的单模光纤在近红外光谱区的γ辐照衰减性质。采用MCVD法制备了光纤。辐照剂量为1 MGy后,分别于2 h、3月和10月测量光纤在1200 ~ 1600 nm光谱范围内的衰减。辐射诱导衰减在1600 nm区域比在1300 nm区域更高且更稳定。在1 MGy的剂量照射下,在1400 ~ 700 cm−1范围内,通过测量吸收光谱的依赖关系,表明了硅玻璃声子光谱的变化。玻璃中氧气含量的增加加速了其网络的破坏。石英玻璃基波段第四次泛音强度的变化证明了光纤在1900 nm光谱区域辐射诱导衰减的性质。随着波长的增加,这种单模光纤在γ辐照下的衰减也与光辐射穿透包层有关,包层的辐射电阻小于芯材的辐射电阻。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Attenuation Nature of Optical Fibers with Oxygen-Deficit Silica Core after γ-Irradiation with 1 MGy Dose

The present work aims to investigate the nature of γ-irradiation induced attenuation in the near-infrared spectral region for single-mode optical fibers with a core made of oxygen-deficit silica glass and a fluorine-doped cladding. The optical fibers were fabricated by the MCVD method. After the irradiation with a dose of 1 MGy the optical fiber attenuation in the spectral range 1200–1600 nm was measured after 2 h, 3 and 10 months. The radiation induced attenuation in the 1600 nm region is higher and more stable than at 1300 nm. The silica glass phonon spectrum change is indicated by the measurements of the spectral dependence of absorption in the region of 1400–700 cm−1 when silica glass grains are irradiated with a dose of 1 MGy. The increased oxygen content in the glass enhances the destruction of its network. The nature of radiation-induced attenuation of fibers in the 1900 nm spectral region is justified by the change in the intensity of the silica glass fundamental band fourth overtone. The attenuation at γ-irradiation with an increasing wavelength in such single-mode fibers is also related to the penetration of optical radiation into the cladding, the radiation resistance of which is less than that of the core material.

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来源期刊
Silicon
Silicon CHEMISTRY, PHYSICAL-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.90
自引率
20.60%
发文量
685
审稿时长
>12 weeks
期刊介绍: The journal Silicon is intended to serve all those involved in studying the role of silicon as an enabling element in materials science. There are no restrictions on disciplinary boundaries provided the focus is on silicon-based materials or adds significantly to the understanding of such materials. Accordingly, such contributions are welcome in the areas of inorganic and organic chemistry, physics, biology, engineering, nanoscience, environmental science, electronics and optoelectronics, and modeling and theory. Relevant silicon-based materials include, but are not limited to, semiconductors, polymers, composites, ceramics, glasses, coatings, resins, composites, small molecules, and thin films.
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