薄膜孔隙度对光学元件表面有机污染物吸附和去除的影响

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Tingting Wang, Qingshun Bai*, Xujie Liu and Xueshi Xu, 
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引用次数: 0

摘要

光学元件薄膜表面有机污染物的破坏限制了惯性约束聚变的载荷能力增强。本研究通过分子动力学模型分析了30-70%多孔二氧化硅膜孔隙率对污染物吸附和激光去除行为的影响。结果表明:膜孔隙率与污染物吸附量呈正相关,但70%的孔隙率导致孔隙不均匀性,影响吸附均匀性和吸附效率;适当的激光能量密度可以提高污染物去除效率,但当能量密度为20 J/cm2时,会导致污染物积累,降低去除效果。高孔隙率薄膜表面吸收激光能量的能力较差,留下的污染物较少,去除效率较低。此外,孔隙率的增加使薄膜更容易受到激光能量的影响,导致激光清洗后Si-O键长、Si-O - si键角和径向分布函数值发生显著变化,导致结构不稳定。这些结果强调了薄膜孔隙度在保持光学元件清洁度方面的关键作用,并为设计高效的薄膜结构提供了重要参考。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Dependence of Film Porosity on the Adsorption and Removal of Organic Contaminants from the Surface of Optical Components

Dependence of Film Porosity on the Adsorption and Removal of Organic Contaminants from the Surface of Optical Components

Damage caused by organic contaminants on the surface of thin films of optical components limits the loading capacity enhancement of inertial confinement fusion. In this study, the effect of porosity of 30–70% porous silica films on contaminant adsorption and laser removal behavior was analyzed by molecular dynamics modeling. The results show that the film porosity is positively correlated with the contaminant adsorption capacity, but 70% porosity leads to pore inhomogeneity, which affects the adsorption uniformity and efficiency. Appropriate laser energy density can improve the contaminant removal efficiency, but an energy density of 20 J/cm2 leads to contaminant accumulation and reduces the removal effect. High-porosity film surfaces have a poorer ability to absorb laser energy, leaving fewer contaminants and lower removal efficiency. In addition, the increased porosity makes the films more susceptible to laser energy, resulting in significant variations in Si–O bond lengths, Si–O–Si bond angles, and radial distribution function values after laser cleaning, leading to structural instability. These results emphasize the critical role of film porosity in maintaining the cleanliness of optical components and provide an important reference for designing efficient thin film structures.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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