中等能量电子束射入生长中的异质外延薄膜时的量子尺寸效应

IF 0.6 4区材料科学 Q4 CRYSTALLOGRAPHY

Crystallography Reports Pub Date : 2025-05-05 DOI:10.1134/S1063774524601928

S. M. Shkornyakov

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引用次数: 0

摘要

计算了中能量（~10 KeV）电子在正常入射下对生长中的单晶薄膜的反射率。结果表明，在这种情况下，会产生量子尺寸效应，这种效应表现为反射光束强度的谐波振荡。振荡的振幅和周期取决于生长薄膜的厚度和入射电子的能量。所得结果用图形说明。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Quantum Size Effect under Normal Incidence of a Medium-Energy Electron Beam onto a Growing Heteroepitaxial Film

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Quantum Size Effect under Normal Incidence of a Medium-Energy Electron Beam onto a Growing Heteroepitaxial Film

The reflectance of medium-energy (~10 KeV) electrons at their normal incidence onto a growing single-crystal thin film has been calculated. It is shown that in this case a quantum size effect occurs, which manifests itself in harmonic oscillations of the reflected beam intensity. The oscillation amplitude and period depend on the thickness of the growing film and the energy of the incident electrons. The results obtained are graphically illustrated.

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来源期刊

Crystallography Reports 化学-晶体学

CiteScore

1.10

自引率

28.60%

发文量

审稿时长

4-8 weeks

期刊介绍： Crystallography Reports is a journal that publishes original articles short communications, and reviews on various aspects of crystallography: diffraction and scattering of X-rays, electrons, and neutrons, determination of crystal structure of inorganic and organic substances, including proteins and other biological substances; UV-VIS and IR spectroscopy; growth, imperfect structure and physical properties of crystals; thin films, liquid crystals, nanomaterials, partially disordered systems, and the methods of studies.