射频电容耦合等离子体参数随磁场强度的变化

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Paul Hiret , Artem Dmitriev , Éric Faudot , Jérôme Moritz , Stéphane Heuraux , Frédéric Brochard , Roland Steiner , Laurent Marot , Alessandro Geraldini , Ivo Furno , Ernst Meyer
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引用次数: 0

摘要

磁场在低温等离子体物理中的应用前景广阔。磁场作用于等离子体带电粒子的动力学,剧烈地改变等离子体中的离子和电子轨迹。在不同的气体和压力下,测量了磁场强度对等离子体参数(如等离子体和电极电位)的影响,证明在高磁场饱和之前有很强的变化。饱和与离子和电子收集面积的变化有关。当磁场影响克服了碰撞效应,即离子的拉莫尔半径小于离子的平均自由程时,就会发生这种情况。静电探针的浮电位饱和是离子磁化的标志。改变压力使磁化放电的碰撞截面计算成为可能。该贡献的估计值与文献一致。最后,在此贡献中开发的探针允许垂直和平行通量的准独立测量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Radio-frequency capacitively coupled plasma parameters evolution as a function of magnetic field strength
The use of magnetic fields in low-temperature plasma physics is promising in numerous applications. The magnetic field acts on the kinetic of the plasma charged particles, drastically modifying the ion and electron trajectories in the plasma. The influence of the magnetic field strength on plasma parameters, like the plasma and the electrode potentials, was measured for different gases and pressures, evidencing a strong variation before saturating for high magnetic fields. The saturation is connected to the variation of the ions and electrons collection area. It occurred when the magnetic field influence overcame the collisional effect, i.e. when the Larmor radius of ions became smaller than the ion mean free path. The electrostatic probe’s floating potential saturation was a marker of ion magnetisation. Varying the pressure enabled collision cross-section calculation for magnetised discharges. The estimated values in this contribution were consistent with the literature. Finally, the probe developed in this contribution allows for the quasi-independent measurement of perpendicular and parallel flux.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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