Modeling of sputtering from solid surfaces under Argon cluster bombardments: comparison with experimental and simulated data

Argon gas cluster sputtering yields serve as a fundamental tool in surface analysis and modification, facilitating precise material characterization and advanced engineering applications. Seah’s universal equation provides a solid foundation for modeling sputtering by Argon cluster; however, its practical application relies on the determination of the three unknown parameters A, q, and B, which are fitting parameters. To overcome this difficulty, a model for sputtering from solid metallic and organic surfaces under Argon cluster impacts is proposed. It represents an extension to Bengeurba‘s model [1] originally developed for sputtering under rapid metallic cluster impacts. Indeed, its application to Argon cluster has revealed a limitation to sputtering yield at low energy. This limitation may arise from the distinct fragmentation dynamics and lower binding energy of Argon clusters, which significantly alter energy deposition sputtering mechanisms. To account for the difference between metallic and non-metallic clusters impact, it is assumed that within the shock conditions generated at the impact on the surface, material ejection or sputtering takes place under the action of a rarefaction wave which propagates inward into the compressed region. The analysis reveals that both the size of the cluster and the mass ratio between the cluster and the target significantly influence on sputtering yield. Additionally, the extended model has been validated using experimental and molecular dynamics simulations data, applied to both metallic and organic material showing excellent agreement. By bridging theoretical predictions with experimental observations and MD simulations, this work provides valuable insights into Argon cluster-induced sputtering phenomena.