晶粒尺寸对Fe-Co合金势垒微凸起界面反应的影响

IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Chongyang Li, Pengfei Chang, Peixin Chen, Anmin Hu, Ming Li
{"title":"晶粒尺寸对Fe-Co合金势垒微凸起界面反应的影响","authors":"Chongyang Li,&nbsp;Pengfei Chang,&nbsp;Peixin Chen,&nbsp;Anmin Hu,&nbsp;Ming Li","doi":"10.1007/s13391-025-00562-y","DOIUrl":null,"url":null,"abstract":"<div><p>Micro-bump plays a pivotal role in enabling high density interconnect required for three-dimensional integrated-circuits (3D ICs) packaging. However, the growth rate of intermetallic compounds (IMCs) in micro-bumps increases with shrinking bump size due to the emergence of surface diffusion channels, posing significant challenges to the reliability of small-sized micro-bumps. In this study, Fe-Co alloys were introduced as innovative diffusion barrier layers to effectively suppress IMC growth in solder bumps, achieving an exceptionally low IMC growth rate of 0.0118 μm/h<sup>0.5</sup>. No sidewall IMCs were observed in micro-bumps, demonstrating the Fe-Co alloys’ effectiveness in inhibiting surface diffusion. Notably, an interesting size effect on IMC growth was observed, with larger Cu plate solder joints exhibiting faster IMC growth compared to 12 μm micro-bumps during aging. This behavior was attributed to grain size differences in the Fe-Co barriers, where smaller grain sizes in larger joints facilitated grain boundary diffusion, thereby accelerating IMC growth. Finite element analysis (FEA) simulations further demonstrated that variations in current density during electrodeposition led to differences in grain size. These findings propose a powerful candidate for high-performance barrier materials in small-sized micro-bumps and provide critical insights into the role of grain boundary diffusion in IMC growth, offering valuable strategies for enhancing the reliability of electronic packaging.</p><h3>Graphical Abstract</h3>\n<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 3","pages":"473 - 485"},"PeriodicalIF":2.1000,"publicationDate":"2025-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Grain Size Effects on Interfacial Reactions in Fe-Co Alloy Barrier Micro-bumps\",\"authors\":\"Chongyang Li,&nbsp;Pengfei Chang,&nbsp;Peixin Chen,&nbsp;Anmin Hu,&nbsp;Ming Li\",\"doi\":\"10.1007/s13391-025-00562-y\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Micro-bump plays a pivotal role in enabling high density interconnect required for three-dimensional integrated-circuits (3D ICs) packaging. However, the growth rate of intermetallic compounds (IMCs) in micro-bumps increases with shrinking bump size due to the emergence of surface diffusion channels, posing significant challenges to the reliability of small-sized micro-bumps. In this study, Fe-Co alloys were introduced as innovative diffusion barrier layers to effectively suppress IMC growth in solder bumps, achieving an exceptionally low IMC growth rate of 0.0118 μm/h<sup>0.5</sup>. No sidewall IMCs were observed in micro-bumps, demonstrating the Fe-Co alloys’ effectiveness in inhibiting surface diffusion. Notably, an interesting size effect on IMC growth was observed, with larger Cu plate solder joints exhibiting faster IMC growth compared to 12 μm micro-bumps during aging. This behavior was attributed to grain size differences in the Fe-Co barriers, where smaller grain sizes in larger joints facilitated grain boundary diffusion, thereby accelerating IMC growth. Finite element analysis (FEA) simulations further demonstrated that variations in current density during electrodeposition led to differences in grain size. These findings propose a powerful candidate for high-performance barrier materials in small-sized micro-bumps and provide critical insights into the role of grain boundary diffusion in IMC growth, offering valuable strategies for enhancing the reliability of electronic packaging.</p><h3>Graphical Abstract</h3>\\n<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>\",\"PeriodicalId\":536,\"journal\":{\"name\":\"Electronic Materials Letters\",\"volume\":\"21 3\",\"pages\":\"473 - 485\"},\"PeriodicalIF\":2.1000,\"publicationDate\":\"2025-03-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electronic Materials Letters\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s13391-025-00562-y\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electronic Materials Letters","FirstCategoryId":"88","ListUrlMain":"https://link.springer.com/article/10.1007/s13391-025-00562-y","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

微碰撞在实现三维集成电路(3D ic)封装所需的高密度互连方面起着关键作用。然而,由于表面扩散通道的出现,金属间化合物(IMCs)在微凸点中的生长速度随着凸点尺寸的缩小而增加,这对小尺寸微凸点的可靠性提出了重大挑战。在本研究中,引入Fe-Co合金作为创新的扩散阻挡层,有效抑制了钎料凸起中IMC的生长,实现了0.0118 μm/h0.5的极低IMC生长速率。在微凸起处没有观察到侧壁IMCs,证明了Fe-Co合金抑制表面扩散的有效性。值得注意的是,在时效过程中观察到一个有趣的尺寸效应,与12 μm微凸起相比,较大的Cu板焊点的IMC生长速度更快。这种行为归因于Fe-Co界面的晶粒尺寸差异,较大的节理中较小的晶粒尺寸有利于晶界扩散,从而加速了IMC的生长。有限元分析(FEA)进一步表明,电沉积过程中电流密度的变化导致了晶粒尺寸的差异。这些发现为小尺寸微凸起中的高性能势垒材料提供了强有力的候选材料,并为晶粒边界扩散在IMC生长中的作用提供了重要见解,为提高电子封装的可靠性提供了有价值的策略。图形抽象
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Grain Size Effects on Interfacial Reactions in Fe-Co Alloy Barrier Micro-bumps

Micro-bump plays a pivotal role in enabling high density interconnect required for three-dimensional integrated-circuits (3D ICs) packaging. However, the growth rate of intermetallic compounds (IMCs) in micro-bumps increases with shrinking bump size due to the emergence of surface diffusion channels, posing significant challenges to the reliability of small-sized micro-bumps. In this study, Fe-Co alloys were introduced as innovative diffusion barrier layers to effectively suppress IMC growth in solder bumps, achieving an exceptionally low IMC growth rate of 0.0118 μm/h0.5. No sidewall IMCs were observed in micro-bumps, demonstrating the Fe-Co alloys’ effectiveness in inhibiting surface diffusion. Notably, an interesting size effect on IMC growth was observed, with larger Cu plate solder joints exhibiting faster IMC growth compared to 12 μm micro-bumps during aging. This behavior was attributed to grain size differences in the Fe-Co barriers, where smaller grain sizes in larger joints facilitated grain boundary diffusion, thereby accelerating IMC growth. Finite element analysis (FEA) simulations further demonstrated that variations in current density during electrodeposition led to differences in grain size. These findings propose a powerful candidate for high-performance barrier materials in small-sized micro-bumps and provide critical insights into the role of grain boundary diffusion in IMC growth, offering valuable strategies for enhancing the reliability of electronic packaging.

Graphical Abstract

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Electronic Materials Letters
Electronic Materials Letters 工程技术-材料科学:综合
CiteScore
4.70
自引率
20.80%
发文量
52
审稿时长
2.3 months
期刊介绍: Electronic Materials Letters is an official journal of the Korean Institute of Metals and Materials. It is a peer-reviewed international journal publishing print and online version. It covers all disciplines of research and technology in electronic materials. Emphasis is placed on science, engineering and applications of advanced materials, including electronic, magnetic, optical, organic, electrochemical, mechanical, and nanoscale materials. The aspects of synthesis and processing include thin films, nanostructures, self assembly, and bulk, all related to thermodynamics, kinetics and/or modeling.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信