Chongyang Li, Pengfei Chang, Peixin Chen, Anmin Hu, Ming Li
{"title":"晶粒尺寸对Fe-Co合金势垒微凸起界面反应的影响","authors":"Chongyang Li, Pengfei Chang, Peixin Chen, Anmin Hu, Ming Li","doi":"10.1007/s13391-025-00562-y","DOIUrl":null,"url":null,"abstract":"<div><p>Micro-bump plays a pivotal role in enabling high density interconnect required for three-dimensional integrated-circuits (3D ICs) packaging. However, the growth rate of intermetallic compounds (IMCs) in micro-bumps increases with shrinking bump size due to the emergence of surface diffusion channels, posing significant challenges to the reliability of small-sized micro-bumps. In this study, Fe-Co alloys were introduced as innovative diffusion barrier layers to effectively suppress IMC growth in solder bumps, achieving an exceptionally low IMC growth rate of 0.0118 μm/h<sup>0.5</sup>. No sidewall IMCs were observed in micro-bumps, demonstrating the Fe-Co alloys’ effectiveness in inhibiting surface diffusion. Notably, an interesting size effect on IMC growth was observed, with larger Cu plate solder joints exhibiting faster IMC growth compared to 12 μm micro-bumps during aging. This behavior was attributed to grain size differences in the Fe-Co barriers, where smaller grain sizes in larger joints facilitated grain boundary diffusion, thereby accelerating IMC growth. Finite element analysis (FEA) simulations further demonstrated that variations in current density during electrodeposition led to differences in grain size. These findings propose a powerful candidate for high-performance barrier materials in small-sized micro-bumps and provide critical insights into the role of grain boundary diffusion in IMC growth, offering valuable strategies for enhancing the reliability of electronic packaging.</p><h3>Graphical Abstract</h3>\n<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 3","pages":"473 - 485"},"PeriodicalIF":2.1000,"publicationDate":"2025-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Grain Size Effects on Interfacial Reactions in Fe-Co Alloy Barrier Micro-bumps\",\"authors\":\"Chongyang Li, Pengfei Chang, Peixin Chen, Anmin Hu, Ming Li\",\"doi\":\"10.1007/s13391-025-00562-y\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Micro-bump plays a pivotal role in enabling high density interconnect required for three-dimensional integrated-circuits (3D ICs) packaging. However, the growth rate of intermetallic compounds (IMCs) in micro-bumps increases with shrinking bump size due to the emergence of surface diffusion channels, posing significant challenges to the reliability of small-sized micro-bumps. In this study, Fe-Co alloys were introduced as innovative diffusion barrier layers to effectively suppress IMC growth in solder bumps, achieving an exceptionally low IMC growth rate of 0.0118 μm/h<sup>0.5</sup>. No sidewall IMCs were observed in micro-bumps, demonstrating the Fe-Co alloys’ effectiveness in inhibiting surface diffusion. Notably, an interesting size effect on IMC growth was observed, with larger Cu plate solder joints exhibiting faster IMC growth compared to 12 μm micro-bumps during aging. This behavior was attributed to grain size differences in the Fe-Co barriers, where smaller grain sizes in larger joints facilitated grain boundary diffusion, thereby accelerating IMC growth. Finite element analysis (FEA) simulations further demonstrated that variations in current density during electrodeposition led to differences in grain size. These findings propose a powerful candidate for high-performance barrier materials in small-sized micro-bumps and provide critical insights into the role of grain boundary diffusion in IMC growth, offering valuable strategies for enhancing the reliability of electronic packaging.</p><h3>Graphical Abstract</h3>\\n<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>\",\"PeriodicalId\":536,\"journal\":{\"name\":\"Electronic Materials Letters\",\"volume\":\"21 3\",\"pages\":\"473 - 485\"},\"PeriodicalIF\":2.1000,\"publicationDate\":\"2025-03-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electronic Materials Letters\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s13391-025-00562-y\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electronic Materials Letters","FirstCategoryId":"88","ListUrlMain":"https://link.springer.com/article/10.1007/s13391-025-00562-y","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Grain Size Effects on Interfacial Reactions in Fe-Co Alloy Barrier Micro-bumps
Micro-bump plays a pivotal role in enabling high density interconnect required for three-dimensional integrated-circuits (3D ICs) packaging. However, the growth rate of intermetallic compounds (IMCs) in micro-bumps increases with shrinking bump size due to the emergence of surface diffusion channels, posing significant challenges to the reliability of small-sized micro-bumps. In this study, Fe-Co alloys were introduced as innovative diffusion barrier layers to effectively suppress IMC growth in solder bumps, achieving an exceptionally low IMC growth rate of 0.0118 μm/h0.5. No sidewall IMCs were observed in micro-bumps, demonstrating the Fe-Co alloys’ effectiveness in inhibiting surface diffusion. Notably, an interesting size effect on IMC growth was observed, with larger Cu plate solder joints exhibiting faster IMC growth compared to 12 μm micro-bumps during aging. This behavior was attributed to grain size differences in the Fe-Co barriers, where smaller grain sizes in larger joints facilitated grain boundary diffusion, thereby accelerating IMC growth. Finite element analysis (FEA) simulations further demonstrated that variations in current density during electrodeposition led to differences in grain size. These findings propose a powerful candidate for high-performance barrier materials in small-sized micro-bumps and provide critical insights into the role of grain boundary diffusion in IMC growth, offering valuable strategies for enhancing the reliability of electronic packaging.
期刊介绍:
Electronic Materials Letters is an official journal of the Korean Institute of Metals and Materials. It is a peer-reviewed international journal publishing print and online version. It covers all disciplines of research and technology in electronic materials. Emphasis is placed on science, engineering and applications of advanced materials, including electronic, magnetic, optical, organic, electrochemical, mechanical, and nanoscale materials. The aspects of synthesis and processing include thin films, nanostructures, self assembly, and bulk, all related to thermodynamics, kinetics and/or modeling.