碳、氢共掺杂AlN薄膜晶格结构随温度的演化机理

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-04-24 DOI:10.1016/j.vacuum.2025.114368

Yu Wu , Ling Dong , Zhengyang Qiao , Hongchuan Jiang , Xiaohui Zhao , Yang Li , Jiawei Tian

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引用次数: 0

摘要

在不同N2/CH4气体流量比下，在石英玻璃上沉积了碳、氢共掺杂AlN薄膜（AlN&C-H）。研究了N2/CH4比对AlN&；C-H样品晶格结构的影响。AlN&；C-H样品的x射线衍射峰明显左移，说明C和H共掺杂导致AlN薄膜晶格膨胀。XPS结果显示了Al晶格上的间隙C-H和取代C-H。高分辨率TEM图像显示碳和氢共掺杂导致了质量位错。采用高温退火方法修复了AlN&；C-H样品的缺陷。阐明了AlN&；C-H样品的晶格结构随温度的演化规律。用x射线衍射角（2θ）表示晶格结构的修复程度。在700 ~ 1100℃的温度范围内，2θ值随温度线性增加。2θ随温度的线性变化关系可作为测温的判据。

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Lattice structure evolution mechanism of carbon and hydrogen co-doped AlN thin films with temperature

Carbon and hydrogen co-doped AlN thin films (AlN&C-H) are deposited on quartz glass with different N₂/CH₄ gas flow ratios. The influence of N₂/CH₄ ratio on the lattice structure of AlN&C-H samples is studied. X-ray diffraction peak of AlN&C-H samples shifts to the left obviously, which illustrates that C and H co-doping lead to lattice expansion of AlN thin films. XPS results indicate the interstitial C-H and the substitutional C-H on the lattice sites of Al. High-resolution TEM images exhibit that carbon and hydrogen co-doping causes mass dislocations. High-temperature annealing is used to repair the defects of AlN&C-H samples. The lattice structure evolution law of AlN&C-H samples with temperature is clarified. X-ray diffraction angle (2θ) is carried out to indicate the lattice structure repair degree. In the temperature range of 700∼1100 °C, the 2θ value increases linearly with temperature. The linear variation relation of 2θ with temperature can be used as a criterion for temperature measurement.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.