钇热阴极模拟及辐射发射率对其性能和功函数测量的影响

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-04-23 DOI:10.1016/j.vacuum.2025.114363

Audrey Mayrat , Quentin Rafhay , Claire Verrier , Jean-Luc Deschanvres

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引用次数: 0

摘要

尽管在半导体器件出现后，热阴极的使用有所减少，但热阴极仍然在专门的探测器和大功率系统中得到应用。本文着重于模拟氧化阴极（Y2O3）的热行为，考虑发射率的变化作为材料和温度的函数。以前对热阴极的大多数研究都忽略了辐射发射率的重要性，辐射发射率是一个显著影响热交换、电子发射以及用理查德森图测量功函数的参数。我们的结果强调需要精确测量材料发射率，以准确评估阴极性能，并使不同阴极类型之间的公平比较。

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Simulation of yttria hot cathode and radiative emissivity impact on its performances and the work function measurement

—Despite the decline in their use after the advent of semiconductor devices, hot cathodes still find applications in specialized detectors and high-power systems. This paper focuses on the simulation of the thermal behavior of an oxide cathode (Y₂O₃), considering the variation in emissivity as a function of both material and temperature. Most previous studies on hot cathodes have overlooked the importance of radiative emissivity, a parameter that significantly affects thermal exchange, electronic emission and hence the measurement of the work function with a Richardson plot. Our results emphasize the need for a precise measurement of material emissivity to accurately assess cathode performance and enable fair comparisons between different cathode types.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.