用于多级存储器和光电逻辑门的铁电 α-In2Se3 半浮栅晶体管

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Yanze Song, Zhidong Pan, Chengming Luo, Yue Wang, Tao Zheng, Yuan Pan, Nabuqi Bu, Ruiyang Xu, Nengjie Huo
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引用次数: 0

摘要

人工智能(AI)的发展需要高效的数据存储和高速处理。传统的冯·诺伊曼架构,由于内存和计算单元的空间分离,与增加的数据传输作斗争,导致电力效率低下和数据延迟。为了解决这一挑战,我们设计了一种半浮栅晶体管(SFGT),该晶体管采用铁电半导体α-In2Se3作为半浮栅层,将数据存储和逻辑运算集成到单个器件中。利用α-In2Se3的铁电极化,该器件具有提高的非易失性存储性能,具有1 × 106的高程序/擦除比和超过1000次循环的可靠耐用性。通过双栅调制,SFGT实现了至少7种可控编程状态的多级存储功能,并在10 mV的超低偏置下实现了“与”、“非”和“或”三种数字逻辑门运算。与传统FGT架构相比,基于α- in2se3的半浮栅结构实现了数据存储和逻辑计算的多功能集成,有效解决了数据传输中的能耗和时延问题,对于数据密集型和低功耗集成电路的应用具有重要意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Ferroelectric α-In2Se3 Semi-floating Gate Transistors for Multilevel Memory and Optoelectronic Logic Gate

Ferroelectric α-In2Se3 Semi-floating Gate Transistors for Multilevel Memory and Optoelectronic Logic Gate
Progress in artificial intelligence (AI) demands efficient data storage and high-speed processing. Traditional von Neumann architecture, with space separation of memory and computing units, struggles with increased data transmission, causing power inefficiency and date latency. To address this challenge, we designed a semi-floating gate transistor (SFGT) that integrates data storage and logical operation into a single device by employing a ferroelectric semiconductor α-In2Se3 as a semi-floating gate layer. Leveraging the ferroelectric polarization of α-In2Se3, the device exhibits improved non-volatile memory performance with a high program/erase ratio of 1 × 106 and reliable durability over 1000 cycles. Through the dual-gate modulation, the SFGT achieves multilevel storage function with at least seven controllable programming states and performs three types of digital logic gate operations (“AND”, “NOR”, and “OR”) at an ultralow bias of 10 mV. Compared to traditional FGT architectures, the α-In2Se3-based semi-floating gate structure achieves multifunctional integration of data storage and logic computing, effectively addressing energy consumption and time delay issues in data transmission, making it highly significant for applications in data-intensive and low-power integrated circuits.
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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