近距离蒸发法制备氧化钼(α-MoO3)层:研究其电子性能和光响应性

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Kurapati Kalyan, Sailakshmi Janga, Shaik M. Abzal, Paramita Maiti, Deepak Kumar Gupta, T. R. Ravindran, Rajkumar Patel, Jatis Kumar Dash
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引用次数: 0

摘要

在这项研究中,我们成功地利用接近蒸发技术合成了α-MoO3纳米层,在大气条件下,将Mo膜定位在距离目标衬底约1mm的地方。这种新方法通过利用环境氧气而无需补充氧气源,从而实现了MoO3的经济高效和规模化生产。在550℃的最佳生长温度下合成的α-MoO3薄膜具有层厚控制好、结晶度高、化学计量均匀等特点。进行了详细的表征,包括XRD的晶体学确认,SEM-EDS的形貌和化学计量学,拉曼光谱的振动模式,紫外-可见光谱的光学性质,揭示了约3.7 eV的可调谐带隙。I-V测量表明,该材料的高电阻为8.7 × 106 Ω,证实了该材料的绝缘性质,最佳介电常数为1253。光响应测量表明,在照明下光电流显著增加,响应度为8.8 a。W−1,检出率1.2 × 1013 J,量子效率18.5%。提出的接近蒸发技术证明了作为一种可扩展的合成高质量二维(2D)过渡金属氧化物(如MoO3)的方法的潜力,具有光电子学和传感应用的意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Growth of molybdenum oxide (α-MoO3) layers through proximity evaporation: studying electronic properties and photo-responsivity

In this study, we successfully synthesized α-MoO3 nanolayers using a proximity evaporation technique, positioning the Mo film approximately 1 mm from the target substrate at atmospheric conditions. This novel method bypasses the need for supplemental oxygen sources by utilizing ambient oxygen, resulting in cost-effective and scalable production of MoO3. The α-MoO3 films synthesized at an optimal growth temperature of 550 °C demonstrate well-controlled layer thickness, high crystallinity, and uniform stoichiometry. Detailed characterizations were performed, including XRD for crystallographic confirmation, SEM–EDS for morphology and stoichiometry, Raman spectroscopy for vibrational modes, and UV–Vis for optical properties, revealing a tunable bandgap of approximately 3.7 eV. I-V measurements indicated a high resistance of 8.7 × 106 Ω, confirming the material’s insulating nature, and an optimum dielectric constant of 1253. Photo-response measurements demonstrated a significant photocurrent increase under illumination, with responsivity 8.8 A.W−1, detectivity1.2 × 1013 J, and quantum efficiency of 18.5%, respectively. The proposed proximity evaporation technique demonstrates potential as a scalable approach for synthesizing high-quality two-dimensional (2D) transition metal oxides like MoO3, with implications for applications in optoelectronics and sensing.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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