阴影辅助侧壁发射在常规紫外光刻中实现亚微米线宽光源

IF 26.6 1区材料科学 Q1 Engineering

Nano-Micro Letters Pub Date : 2025-04-22 DOI:10.1007/s40820-025-01737-w

Junlong Li, Yanmin Guo, Kun Wang, Wei Huang, Hao Su, Wenhao Li, Xiongtu Zhou, Yongai Zhang, Tailiang Guo, Chaoxing Wu

{"title":"阴影辅助侧壁发射在常规紫外光刻中实现亚微米线宽光源","authors":"Junlong Li, Yanmin Guo, Kun Wang, Wei Huang, Hao Su, Wenhao Li, Xiongtu Zhou, Yongai Zhang, Tailiang Guo, Chaoxing Wu","doi":"10.1007/s40820-025-01737-w","DOIUrl":null,"url":null,"abstract":"<div><h2>Highlights</h2><div>\n \n <ul>\n <li>\n <p>The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns.</p>\n </li>\n <li>\n <p>A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall emission.</p>\n </li>\n <li>\n <p>The submicron light source fabricated by the shadow-assisted sidewall emission exhibits strong scalability and has been proved to be applicable in optical anti-counterfeiting.</p>\n </li>\n </ul>\n </div></div>","PeriodicalId":714,"journal":{"name":"Nano-Micro Letters","volume":"17 1","pages":""},"PeriodicalIF":26.6000,"publicationDate":"2025-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s40820-025-01737-w.pdf","citationCount":"0","resultStr":"{\"title\":\"Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography\",\"authors\":\"Junlong Li, Yanmin Guo, Kun Wang, Wei Huang, Hao Su, Wenhao Li, Xiongtu Zhou, Yongai Zhang, Tailiang Guo, Chaoxing Wu\",\"doi\":\"10.1007/s40820-025-01737-w\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><h2>Highlights</h2><div>\\n \\n <ul>\\n <li>\\n <p>The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns.</p>\\n </li>\\n <li>\\n <p>A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall emission.</p>\\n </li>\\n <li>\\n <p>The submicron light source fabricated by the shadow-assisted sidewall emission exhibits strong scalability and has been proved to be applicable in optical anti-counterfeiting.</p>\\n </li>\\n </ul>\\n </div></div>\",\"PeriodicalId\":714,\"journal\":{\"name\":\"Nano-Micro Letters\",\"volume\":\"17 1\",\"pages\":\"\"},\"PeriodicalIF\":26.6000,\"publicationDate\":\"2025-04-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://link.springer.com/content/pdf/10.1007/s40820-025-01737-w.pdf\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nano-Micro Letters\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s40820-025-01737-w\",\"RegionNum\":1,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"Engineering\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nano-Micro Letters","FirstCategoryId":"88","ListUrlMain":"https://link.springer.com/article/10.1007/s40820-025-01737-w","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"Engineering","Score":null,"Total":0}

引用次数: 0

摘要

亚微米光源仅通过常规UV光刻工艺实现，从而实现任意图案的亚微米光源。提出了一种制造亚微米光源的新方法——阴影辅助侧壁发射。利用阴影辅助侧壁发射制备的亚微米光源具有较强的可扩展性，在光学防伪方面具有较好的应用前景。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography

Highlights

The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns.
A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall emission.
The submicron light source fabricated by the shadow-assisted sidewall emission exhibits strong scalability and has been proved to be applicable in optical anti-counterfeiting.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Nano-Micro Letters NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY

CiteScore

32.60

自引率

4.90%

发文量

981

审稿时长

1.1 months

期刊介绍： Nano-Micro Letters is a peer-reviewed, international, interdisciplinary, and open-access journal published under the SpringerOpen brand. Nano-Micro Letters focuses on the science, experiments, engineering, technologies, and applications of nano- or microscale structures and systems in various fields such as physics, chemistry, biology, material science, and pharmacy.It also explores the expanding interfaces between these fields. Nano-Micro Letters particularly emphasizes the bottom-up approach in the length scale from nano to micro. This approach is crucial for achieving industrial applications in nanotechnology, as it involves the assembly, modification, and control of nanostructures on a microscale.