通过掺杂提高p型Mg2Si热电性能:第一性原理研究

IF 2.7 Q2 PHYSICS, CONDENSED MATTER
Piyawong Poopanya , Saowalak Siatrakool , Pratik M. Gadhavi , Kanchana Sivalertporn
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引用次数: 0

摘要

本研究利用第一性原理计算研究了p型掺杂Mg2Si的结构和输运性质。重点研究了在Mg2Si中掺杂Li、Ga、F和LiGaF以提高其热电性能。系统分析了形成能(ΔE)、晶格常数、塞贝克系数、电导率和功率因数,以确定掺杂对材料性能的影响。结果表明,在Mg位掺杂Li,在Si位掺杂Ga,在4b位掺杂F可以得到最稳定的p型Mg2Si结构,其ΔE值最低。这些掺杂剂提高了p型电导率,优化了热电性能,特别是在500-1000 K的温度范围内。计算的输运性质表明,Li和f掺杂的Mg2Si在高温下表现出优异的性能,使它们成为热电应用的有希望的候选者。本研究为今后提高p型Mg2Si热电效率的实验工作奠定了基础。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Enhancing thermoelectric performance of p-type Mg2Si through doping: A first-principles study
This study investigates the structural and transport properties of p-type doped Mg2Si using first-principles calculations. The focus is on doping Mg2Si with Li, Ga, F, and LiGaF to enhance its thermoelectric performance. The formation energy (ΔE), lattice constant, Seebeck coefficient, electrical conductivity, and power factor are systematically analyzed to determine the impact of doping on the material's properties. Our results show that doping with Li at the Mg site, Ga at the Si site, and F at the 4b site results in the most stable p-type Mg2Si structure, with the lowest ΔE values. These dopants improve p-type conductivity and optimize the thermoelectric performance, particularly in the temperature range of 500–1000 K. The calculated transport properties reveal that Li- and F-doped Mg2Si exhibit superior performance at high temperatures, making them promising candidates for thermoelectric applications. This research lays the groundwork for future experimental efforts to enhance the thermoelectric efficiency of p-type Mg2Si.
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CiteScore
6.50
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