CVD法生长ga掺杂WS2单层膜的显著发光增强

IF 3.7 3区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Shuai Zhang, Andre N. Barbosa*, Munique Eva Paiva de Araujo Monteiro de Barros, Alexandre Mello, Kevin Lizárraga, Pedro Paulo de Mello Venezuela and Fernando Lázaro Freire Jr., 
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引用次数: 0

摘要

单层二硫化钨(WS2)是一种具有优异发光性能的直接带隙半导体,在光电子领域具有重要的应用价值。在本研究中,我们研究了镓(Ga)对化学气相沉积法制备WS2单层膜的影响。我们的研究结果表明,与原始WS2相比,ga掺杂的WS2样品的光致发光强度增加了3.6倍。为了证实Ga在WS2结构中的存在,利用了共振拉曼光谱和x射线光电子能谱(XPS)作为表征方法。观察到XPS光谱的红移以及无序相关拉曼模式的增加,这归因于Ga的影响。XPS分析和从头算电子结构计算表明,在WS2表面存在取代的Ga原子和吸附的Ga原子。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Significant Luminescence Enhancement of Ga-Doped WS2 Monolayers Grown by CVD

Monolayer tungsten disulfide (WS2) is a direct-band-gap semiconductor that has excellent luminescence properties, which are of great interest for optoelectronic applications. In this study, we investigated the effect of gallium (Ga) on WS2 monolayers grown by chemical vapor deposition. Our results indicate that Ga-doped WS2 exhibits a 3.6-fold increase in photoluminescence intensity for doped samples compared to pristine WS2. To confirm the existence of Ga in the WS2 structures, resonance Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) were utilized as characterization methods. A redshift of the XPS spectrum was observed as well as an increase in the disorder-related Raman modes, which were attributed to the influence of Ga. XPS analysis and ab initio electronic structure calculations reveal the presence of substitutional Ga atoms as well as Ga atoms adsorbed on WS2 surfaces.

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来源期刊
ACS Omega
ACS Omega Chemical Engineering-General Chemical Engineering
CiteScore
6.60
自引率
4.90%
发文量
3945
审稿时长
2.4 months
期刊介绍: ACS Omega is an open-access global publication for scientific articles that describe new findings in chemistry and interfacing areas of science, without any perceived evaluation of immediate impact.
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