（111）取向SrTiO3表面沉积La: HfO2外延薄膜

IF 2.5 4区材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Applied Physics A Pub Date : 2025-04-18 DOI:10.1007/s00339-025-08513-y

Mingkai Qing, Peijie Jiao, Hongying Chen, Zhiyu Liu, Yu Deng, Di Wu

{"title":"（111）取向SrTiO3表面沉积La: HfO2外延薄膜","authors":"Mingkai Qing, Peijie Jiao, Hongying Chen, Zhiyu Liu, Yu Deng, Di Wu","doi":"10.1007/s00339-025-08513-y","DOIUrl":null,"url":null,"abstract":"<div>(111)-oriented 5%La: HfO2 (HLO) thin films have been successfully deposited on La0.67Sr0.33MnO3 buffered (111)-oriented SrTiO3 (STO) substrates by pulsed laser deposition. The growth of the orthorhombic HLO films with a rhombohedral distortion follows a domain matching epitaxy mechanism and twin domains appear as revealed by atomic resolution scanning transmission electron microscopy. These (111)-oriented HLO films show 6-fold in-plane symmetry due to the twin domains rotated 180° to each other around the surface normal. The HLO films, 15 nm in thickness, on (111)-oriented STO exhibit robust ferroelectric properties with an optimized remanent polarization around 13 µC/cm2 without any wake-up process.</div>","PeriodicalId":473,"journal":{"name":"Applied Physics A","volume":"131 5","pages":""},"PeriodicalIF":2.5000,"publicationDate":"2025-04-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Epitaxial La: HfO2 films deposited on (111)-oriented SrTiO3\",\"authors\":\"Mingkai Qing, Peijie Jiao, Hongying Chen, Zhiyu Liu, Yu Deng, Di Wu\",\"doi\":\"10.1007/s00339-025-08513-y\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div>(111)-oriented 5%La: HfO2 (HLO) thin films have been successfully deposited on La0.67Sr0.33MnO3 buffered (111)-oriented SrTiO3 (STO) substrates by pulsed laser deposition. The growth of the orthorhombic HLO films with a rhombohedral distortion follows a domain matching epitaxy mechanism and twin domains appear as revealed by atomic resolution scanning transmission electron microscopy. These (111)-oriented HLO films show 6-fold in-plane symmetry due to the twin domains rotated 180° to each other around the surface normal. The HLO films, 15 nm in thickness, on (111)-oriented STO exhibit robust ferroelectric properties with an optimized remanent polarization around 13 µC/cm2 without any wake-up process.</div>\",\"PeriodicalId\":473,\"journal\":{\"name\":\"Applied Physics A\",\"volume\":\"131 5\",\"pages\":\"\"},\"PeriodicalIF\":2.5000,\"publicationDate\":\"2025-04-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Applied Physics A\",\"FirstCategoryId\":\"4\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s00339-025-08513-y\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Physics A","FirstCategoryId":"4","ListUrlMain":"https://link.springer.com/article/10.1007/s00339-025-08513-y","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}

引用次数: 0

摘要

采用脉冲激光沉积技术在La0.67Sr0.33MnO3缓冲的（111）取向SrTiO3 （STO）衬底上成功地制备了5%La: HfO2 （HLO）薄膜。具有菱形畸变的正交HLO薄膜的生长遵循域匹配外延机制，原子分辨扫描透射电子显微镜显示双畴的存在。这些（111）取向的HLO薄膜表现出6倍的面内对称性，这是由于双畴围绕表面法线相互旋转了180°。在（111）取向STO上，厚度为15 nm的HLO薄膜表现出强大的铁电性能，其优化的剩余极化约为13µC/cm2，没有任何唤醒过程。

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Epitaxial La: HfO2 films deposited on (111)-oriented SrTiO3

(111)-oriented 5%La: HfO₂ (HLO) thin films have been successfully deposited on La_0.67Sr_0.33MnO₃ buffered (111)-oriented SrTiO₃ (STO) substrates by pulsed laser deposition. The growth of the orthorhombic HLO films with a rhombohedral distortion follows a domain matching epitaxy mechanism and twin domains appear as revealed by atomic resolution scanning transmission electron microscopy. These (111)-oriented HLO films show 6-fold in-plane symmetry due to the twin domains rotated 180° to each other around the surface normal. The HLO films, 15 nm in thickness, on (111)-oriented STO exhibit robust ferroelectric properties with an optimized remanent polarization around 13 µC/cm² without any wake-up process.

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来源期刊

Applied Physics A 工程技术-材料科学：综合

CiteScore

4.80

自引率

7.40%

发文量

964

审稿时长

38 days

期刊介绍： Applied Physics A publishes experimental and theoretical investigations in applied physics as regular articles, rapid communications, and invited papers. The distinguished 30-member Board of Editors reflects the interdisciplinary approach of the journal and ensures the highest quality of peer review.