基于半集总π型拓扑和交叉耦合技术的高选择性陡衰减集成无源器件片上滤波器

0 ENGINEERING, ELECTRICAL & ELECTRONIC
Hao-Ran Zhu;Wen-Tao Wang;Lv-Bo Ma;Tao Ni
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引用次数: 0

摘要

本文提出了一种高选择性集成无源器件(IPD)片上带通滤波器。利用改进的半集总K逆变器在上阻带处产生两个传输零点。半集总$\pi $型部分设计用于在下阻带处实现另外两个TZs。此外,还采用交叉耦合技术引入TZ,提高了通带附近的频率选择性和阻带处的衰减水平。采用砷化镓工艺制备了尺寸为1.125\ × 0.565$ mm2的芯片样品。测量结果表明,中心频率为27 GHz,分数带宽为39%,插入损耗(IL)为1.73 dB。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A High Selectivity and Steep Attenuation Integrated Passive Device On-Chip Filter With Semi-Lumped π-Type Topology and Cross-Coupling Technique
In this letter, a high selectivity integrated passive device (IPD) on-chip bandpass filter with compact size is presented. The modified semi-lumped K inverter is utilized to generate two transmission zeros (TZs) at upper stopband. The semi-lumped $\pi $ type section is designed to achieve another two TZs at the lower stopband. Moreover, cross-coupling technology is also employed to introduce TZ, which can improve the frequency selectivity near the passband and the attenuation level at the stopband. A chip sample is fabricated with gallium arsenide processing with a size $1.125\times 0.565$ mm2. The measurement results show that the center frequency is 27 GHz, the fractional bandwidth is 39%, and the insertion loss (IL) is 1.73 dB.
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