IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
S. Keerthi Gopakumar, S. Vinu, Y. K. Pratheesha Mol, S. Sindhusha, R. Sheela Christy, G. Vinitha
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引用次数: 0

摘要

利用缓慢蒸发法在室温下合成了一种有机 NLO 单晶--4-乙酰基吡啶富马酸(4APFA),单晶 XRD 分析证实生长出的晶体为三菱形,具有中心对称空间群 P\(\overline{1 }\) 。利用密度泛函理论(DFT)方法,实验结果与理论值相关联。通过 NBO 分析了解到氢键相互作用的存在稳定了分子结构。HOMO-LUMO 分析预测了分子的较高稳定性和反应活性。由于存在 N-H...O(氢键)相互作用,O-H(氢键)相互作用(39.4%)是造成整体晶体堆积的主要因素。傅立叶变换红外光谱和傅立叶变换拉曼光谱被用来识别富马酸 4-乙酰吡啶中存在的不同官能团。4APFA 的紫外-可见光谱分析显示其在整个可见光区域都具有很高的透光率。通过荧光光谱分析,确定了该材料的蓝带发射。TG/DTA 研究表明,4APFA 的热稳定性高达 160 °C。生长出来的 4APFA 晶体具有优异的原子堆积和良好的机械稳定性,因此适合于器件制造。4.526 × 10-6 esu 的较高三阶电感和 4.24 × 10-9 cm2/W 的非线性折射率值表明,生长出的 4APFA 晶体具有优异的 NLO 性能,因此非常适合设计和制造光功率限制器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Experimental and computational investigations on 4-acetyl pyridine fumaric acid single crystal for nonlinear optical applications

An organic NLO single crystal, 4-acetylpyridine fumaric acid (4APFA), was synthesized at room temperature using the slow evaporation method, and single crystal XRD analysis confirmed that the grown crystal is triclinic with a centrosymmetric space group P\(\overline{1 }\). Using the density functional theory (DFT) approach, experimental results were correlated with theoretical values. The presence of hydrogen bonding interactions that stabilize the molecular structure was understood through NBO analysis. HOMO–LUMO analysis predicts the higher stability and reactivity of the molecule. The major factor contributing to overall crystal packing arises from O–H interactions (39.4%) due to the presence of N–H…O hydrogen bonding interactions. FT-IR and FT-Raman spectroscopy were used to identify different functional groups present in 4-acetyl pyridine fumaric acid. UV-visible spectral analysis of 4APFA shows high optical transmittance throughout the visible region. The material’s blue-band emission was identified through fluorescence spectral analysis. TG/DTA investigation revealed that 4APFA is thermally stable up to 160 °C. The grown 4APFA crystal exhibits excellent atomic packing and good mechanical stability, making it suitable for device fabrication. The higher third-order susceptibility of 4.526 × 10–6 esu and a nonlinear refractive index value of 4.24 × 10–9 cm2/W indicate that the grown 4APFA crystal demonstrates superior NLO behavior, making it highly promising for the design and manufacturing of optical power-limiting devices.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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