Owen R. Meilander, Haley E. Dishman, Swarnim Neema, Mona A. Ebrish
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Investigation of plasma etch damage in GaN on commercially available substrates by Raman spectroscopy
In this work, we evaluate the quality of a commercially available GaN/AlGaN structure grown on Qromis Substrate Technology using Raman spectroscopy. Using the shift of the E2H peak, we calculated that initially this GaN structure has a lower biaxial stress than commercially available GaN on sapphire. After Cl2/Ar based reactive ion etching, surface damage was evident by an 80% stress increase. However, the implementation of wet alkaline etch treatments using potassium hydroxide and tetramethyl ammonium hydroxide (TMAH) relieved the stress by equal amounts. While these results indicate equivalent recovery between treatments, devices fabricated with a TMAH treatment exhibit superior electrical behavior.
期刊介绍:
Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology.
In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics.
APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field.
Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.