均相和非均相掺杂剂对砷化镓纳米点结构、电学和热力学性质的影响:DFT研究

Aoly Ur Rahman , D.M. Saaduzzaman , Syed Mahedi Hasan , Md Kabir Uddin Sikder
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摘要

近年来,低维半导体材料因其在技术领域的广泛适用性而受到研究人员的关注。在不同的半导体材料中,砷化镓(GaAs)由于其直接带隙和高电子迁移率而成为开发器件的第二大突出材料。在这项工作中,连续掺杂均相过渡金属(Ir-Ir)和非均相过渡金属(Ir-Ru &;研究了Ir-Pd)。采用密度泛函理论(DFT)和B3LYP混合泛函,在LanL2DZ基集上进行了研究。研究表明,GaAs纳米点的稳定性更高(掺杂团簇为- 98 eV ~ - 468 eV,未掺杂团簇为- 21 eV),效率更高,这一点通过研究非均相掺杂过程中的结合能和键长得到了证实。此外,红外(IR)光谱分析证实,除了Ga2As2Ir2Ru2外,由于虚频率的存在,所有结构都可能处于稳定的真实能量最小值中。此外,带隙(所有掺杂结构的带隙为1.2 eV - 2 eV)显示出掺杂结构的合适的半导体性质。热力学性质表明,均相和异相掺杂技术均能提高GaAs纳米点的热力学稳定性,并使其更具可行性。最后,综合考虑了各种物理化学性质,得出了在掺杂量相同的情况下,对于GaAs纳米点,异相原子掺杂工艺比均相原子掺杂工艺效率更高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influences of homogenous and heterogenous dopants on structural, electric, and thermodynamic properties of the gallium arsenide (GaAs) nanodot: A DFT study
In recent times, low-dimensional semiconducting materials have drawn the attention of researchers due to their wide range of applicability in technological sectors. Among different semiconducting materials, gallium arsenide (GaAs) is the second most prominent materials for developing devices due to its direct band gap and high electron mobility. In this work, the geometric, electronic, and thermodynamic properties of the GaAs nanodot after consecutive doping with homogenous transition metals (Ir–Ir) and heterogeneous transition metals (Ir–Ru & Ir–Pd) have been investigated. The investigation has been performed by employing density functional theory (DFT) with B3LYP hybrid functional using LanL2DZ basis set. The investigation reveals that the GaAs nanodot gains more stability (−98 eV ∼ −468 eV for doped clusters and −21 eV for the pristine cluster) and becomes efficient which is confirmed by studying binding energy and bond lengths in the heterogeneous doping process rather than the sequential homogenous doping process. Moreover, the infrared (IR) spectra analysis confirms that all structures might be found naturally in a stable and true energy minima, except Ga2As2Ir2Ru2, because of the presence of imaginary frequency. Also, the band gap (1.2 eV–2 eV for all doped structures) exhibits a suitable semiconducting nature of the doped structures. The thermodynamic properties show that both homogenous and heterogenous doping techniques cause thermodynamic stability to the GaAs nanodot as well as make them more feasible. Finally, considering all the physicochemical properties it has been concluded that for GaAs nanodot, the heterogenous atom doping process is more efficient than the homogenous atom doping when the dopant number is the same.
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