Xiaoting Li, Shuang Lv, Zhengguan Dai, Yuzheng He, Zongrong Wang, Ning Ma, Piyi Du
{"title":"具有超低偏压下高介电可调性的钡铁氧体薄膜","authors":"Xiaoting Li, Shuang Lv, Zhengguan Dai, Yuzheng He, Zongrong Wang, Ning Ma, Piyi Du","doi":"10.1007/s10854-025-14679-1","DOIUrl":null,"url":null,"abstract":"<div><p>The barium ferrites (BaFeO<sub>12</sub>) thin films with barium ions of over stoichiometry ratio of Ba/Fe = x/12 (x = 1.0–3.0) in sol precursor were successfully prepared on silicon substrates by sol–gel and spin-coating method. Results show that the rod-like ferrite grains of 100 ~ 200 nm in size were formed densely in the thin film. The (00<i> l</i>) orientation of the ferrite phase was controlled to form in the thin film. Excess Ba<sup>2+</sup> existed in cell lattice and doped in the interstitial sites of triangular biconical or octahedral interstices. Fe<sup>2+</sup>/Fe<sup>3+</sup> electron pair dipoles were generated by doping Ba<sup>2+</sup>, increasing initially and decreasing finally. The highest content of Fe<sup>2+</sup>/Fe<sup>3+</sup> dipoles appeared in the 4-layered thin film prepared with over stoichiometry ratio of Ba:Fe = 2:12 in sol precursor, contributing a highest dielectric tunability of 69%, low dielectric loss of 0.03 and FOM of 21.6 at 10 kHz under super low DC bias of ~ 200 V/cm. Such high tunability and low loss under super low electric field in the barium ferrite thin films show great potential for novel applications in dielectric tunable devices.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"36 10","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-04-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Interstitial Ba2+ ions doped (00 l) oriented barium ferrite thin film with high dielectric tunability under ultra-low bias for microwave applications\",\"authors\":\"Xiaoting Li, Shuang Lv, Zhengguan Dai, Yuzheng He, Zongrong Wang, Ning Ma, Piyi Du\",\"doi\":\"10.1007/s10854-025-14679-1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The barium ferrites (BaFeO<sub>12</sub>) thin films with barium ions of over stoichiometry ratio of Ba/Fe = x/12 (x = 1.0–3.0) in sol precursor were successfully prepared on silicon substrates by sol–gel and spin-coating method. Results show that the rod-like ferrite grains of 100 ~ 200 nm in size were formed densely in the thin film. The (00<i> l</i>) orientation of the ferrite phase was controlled to form in the thin film. Excess Ba<sup>2+</sup> existed in cell lattice and doped in the interstitial sites of triangular biconical or octahedral interstices. Fe<sup>2+</sup>/Fe<sup>3+</sup> electron pair dipoles were generated by doping Ba<sup>2+</sup>, increasing initially and decreasing finally. The highest content of Fe<sup>2+</sup>/Fe<sup>3+</sup> dipoles appeared in the 4-layered thin film prepared with over stoichiometry ratio of Ba:Fe = 2:12 in sol precursor, contributing a highest dielectric tunability of 69%, low dielectric loss of 0.03 and FOM of 21.6 at 10 kHz under super low DC bias of ~ 200 V/cm. Such high tunability and low loss under super low electric field in the barium ferrite thin films show great potential for novel applications in dielectric tunable devices.</p></div>\",\"PeriodicalId\":646,\"journal\":{\"name\":\"Journal of Materials Science: Materials in Electronics\",\"volume\":\"36 10\",\"pages\":\"\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2025-04-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Science: Materials in Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10854-025-14679-1\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-025-14679-1","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Interstitial Ba2+ ions doped (00 l) oriented barium ferrite thin film with high dielectric tunability under ultra-low bias for microwave applications
The barium ferrites (BaFeO12) thin films with barium ions of over stoichiometry ratio of Ba/Fe = x/12 (x = 1.0–3.0) in sol precursor were successfully prepared on silicon substrates by sol–gel and spin-coating method. Results show that the rod-like ferrite grains of 100 ~ 200 nm in size were formed densely in the thin film. The (00 l) orientation of the ferrite phase was controlled to form in the thin film. Excess Ba2+ existed in cell lattice and doped in the interstitial sites of triangular biconical or octahedral interstices. Fe2+/Fe3+ electron pair dipoles were generated by doping Ba2+, increasing initially and decreasing finally. The highest content of Fe2+/Fe3+ dipoles appeared in the 4-layered thin film prepared with over stoichiometry ratio of Ba:Fe = 2:12 in sol precursor, contributing a highest dielectric tunability of 69%, low dielectric loss of 0.03 and FOM of 21.6 at 10 kHz under super low DC bias of ~ 200 V/cm. Such high tunability and low loss under super low electric field in the barium ferrite thin films show great potential for novel applications in dielectric tunable devices.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.