Yawen Gao, Changsheng Chen, Feng Wang, Mingbo Li, Chao Sun
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Characterization and removal of contaminants in lithography
Photolithography is a foundational technique for manufacture compact chips in semiconductor industries. Regulating and cleaning contaminants in lithographic processes are crucial for achieving the higher resolution and smaller feature sizes, which contain a variety of physical phenomena related to fluid dynamics. In this review, we will first introduce the basic principles of two mainstream lithography, namely deep ultraviolet (DUV) lithography and extreme ultraviolet (EUV) lithography. We critically review several types of contaminants such as droplets, bubbles, particles and chemical organic pollutants, highlighting the advanced techniques for identifying the nano-substances and fluid behaviours. Then the control strategies for mitigating contaminants are reviewed, especially for the contamination removal on photomask, the improvement on the purity of immersion liquid and efficient cleaning treatment for wafer surface. This review underscores the critical need for advanced contaminant management strategies in photolithography, integrating innovative cleaning techniques that promise to elevate lithographic performance and drive future developments in semiconductor technology.
期刊介绍:
Science China Physics, Mechanics & Astronomy, an academic journal cosponsored by the Chinese Academy of Sciences and the National Natural Science Foundation of China, and published by Science China Press, is committed to publishing high-quality, original results in both basic and applied research.
Science China Physics, Mechanics & Astronomy, is published in both print and electronic forms. It is indexed by Science Citation Index.
Categories of articles:
Reviews summarize representative results and achievements in a particular topic or an area, comment on the current state of research, and advise on the research directions. The author’s own opinion and related discussion is requested.
Research papers report on important original results in all areas of physics, mechanics and astronomy.
Brief reports present short reports in a timely manner of the latest important results.