氮掺杂碳上高密度Ni单原子位的低温构建促进双通道氧还原。

IF 4.2 2区化学 Q2 CHEMISTRY, MULTIDISCIPLINARY

Chemical Communications Pub Date : 2025-03-11 DOI:10.1039/d5cc00264h

Ke Yang , Sili Liu , Xinhua Li , Wanchuan Jin , Fen Luo , Ruishi Xie , Yuanli Li

引用次数: 0

摘要

本文提出了一种低温配体预氧化策略，用于在非晶态氮掺杂碳衬底上设计高密度Ni单原子位。得到的Ni-O@NC促进了双通道氧还原，过氧化氢选择性约为92.6%。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Low-temperature construction of high-density Ni single-atom sites on nitrogen-doped carbon to boost dual-channel oxygen reduction†

查看原文本刊更多论文

Low-temperature construction of high-density Ni single-atom sites on nitrogen-doped carbon to boost dual-channel oxygen reduction†

Herein, a low-temperature ligand pre-oxidation strategy is proposed to design high-density Ni single-atom sites on amorphous nitrogen-doped carbon substrates. The obtained Ni–O@NC boosts dual-channel oxygen reduction and exhibits about 92.6% hydrogen peroxide selectivity.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Chemical Communications 化学-化学综合

CiteScore

8.60

自引率

4.10%

发文量

2705

审稿时长

1.4 months

期刊介绍： ChemComm (Chemical Communications) is renowned as the fastest publisher of articles providing information on new avenues of research, drawn from all the world''s major areas of chemical research.