常温条件下可喷墨打印分子基铜油墨的光子烧结

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Sean Jackson, Shenqiang Ren, Jian Yu
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引用次数: 0

摘要

铜(Cu)基油墨为在电子设备中创建导电通路提供了一种高效且经济的解决方案。然而,铜油墨加工的主要挑战之一反映了铜的高化学反应性和氧化敏感性,这可能会影响其在热烧结加工后的电性能。为了解决这一挑战,铜烧结通常通过使用惰性或还原性气氛来精确控制环境条件,以防止氧化并确保导电性。为了克服这些加工要求,我们报告了一种可喷墨打印的、热还原的分子基铜墨水的合成,该墨水与光子脉冲烧结加工技术兼容,允许铜膜沉积的热烧结而不需要环境调节。在喷墨印刷基板图案化之后,在大气条件下通过光子脉冲烧结分子基铜油墨,从而在玻璃和聚酰亚胺(Kapton®)、聚碳酸酯(PC)和聚醚酰亚胺(PEI)聚合物基板上沉积导电铜痕迹。暗场显微镜、扫描电子显微镜、x射线衍射光谱和四点探针电测试,加上手写笔轮廓术,允许对Cu薄膜进行宏观结构、微观结构、光谱和电学表征,鉴定出没有铜氧化物污染的Cu沉积,最小片电阻值为0.235欧姆。这项研究开启了铜在低温衬底和大规模印刷电路的电子产品中广泛使用的潜力,而不需要在生产过程中进行昂贵的环境控制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photonic sintering of inkjet printable molecular base copper ink at ambient conditions

Copper (Cu)-based inks provide an efficient and cost-effective solution for creating conductive pathways in electronic devices. However, one of the major challenges regarding Cu ink processing reflects Cu’s high chemical reactivity and oxidation sensitivity, which can compromise its electrical performance following thermal sinter processing. To address this challenge, Cu sintering is typically performed with precise control of ambient conditions through use of an inert or reducing atmosphere to prevent oxidation and ensure electrical conductivity. To overcome these processing requirements, we report on the synthesis of an inkjet printable, thermally reducible molecular base copper ink that demonstrates compatibility with photonic pulse sinter processing technologies, permitting thermal sintering for copper film deposition without requirement for environmental conditioning. Following inkjet print substrate patterning, molecular base copper inks were sintered via photonic pulse under atmospheric conditions, resulting in the deposition of conductive copper traces on glass and polyimide (Kapton®), polycarbonate (PC), and polyetherimide (PEI) polymer substrates. Dark-field microscopy, scanning electron microscopy, X-ray diffraction spectroscopy, and four-point probe electrical testing, coupled with stylus profilometry, permitted macrostructural, microstructural, spectral, and electrical characterization of Cu films, identifying Cu deposition without contamination of copper oxides and minimum sheet resistance values of 0.235 Ohm. This study unlocks the potential for widespread use of copper in electronics with low-temperature substrates and large-scale printed circuits without the need for costly environmental controls during production.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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