{"title":"SrTiO3/云母异质界面上范德华相互作用和离子相互作用的竞争","authors":"Renhong Liang, Shanming Ke","doi":"10.1063/5.0260844","DOIUrl":null,"url":null,"abstract":"Growing a 3D film on a 2D substrate, a process often referred to as quasi-van der Waals (vdW) epitaxy, is generally believed to involve both chemical and vdW interactions at the interface. To date, the competition between chemical and vdW interactions at the interface has yet to be established. In this work, we demonstrate that the chemical activity of deposited species is crucial for determining the structure of the 3D/2D heterointerface. During pulsed laser deposition, the chemical activity of SrTiO3 (STO) can be adjusted by controlling the oxygen partial pressure. Therefore, the relative contributions of chemical and vdW interactions at the STO/mica interface can be tuned. This finding ultimately explains the coexistence of [111] and [001] orientations in STO epitaxy on mica.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":"29 1","pages":""},"PeriodicalIF":3.6000,"publicationDate":"2025-03-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The competition between van der Waals and ionic interactions at the SrTiO3/mica heterointerface\",\"authors\":\"Renhong Liang, Shanming Ke\",\"doi\":\"10.1063/5.0260844\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Growing a 3D film on a 2D substrate, a process often referred to as quasi-van der Waals (vdW) epitaxy, is generally believed to involve both chemical and vdW interactions at the interface. To date, the competition between chemical and vdW interactions at the interface has yet to be established. In this work, we demonstrate that the chemical activity of deposited species is crucial for determining the structure of the 3D/2D heterointerface. During pulsed laser deposition, the chemical activity of SrTiO3 (STO) can be adjusted by controlling the oxygen partial pressure. Therefore, the relative contributions of chemical and vdW interactions at the STO/mica interface can be tuned. This finding ultimately explains the coexistence of [111] and [001] orientations in STO epitaxy on mica.\",\"PeriodicalId\":8094,\"journal\":{\"name\":\"Applied Physics Letters\",\"volume\":\"29 1\",\"pages\":\"\"},\"PeriodicalIF\":3.6000,\"publicationDate\":\"2025-03-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Applied Physics Letters\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1063/5.0260844\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1063/5.0260844","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
The competition between van der Waals and ionic interactions at the SrTiO3/mica heterointerface
Growing a 3D film on a 2D substrate, a process often referred to as quasi-van der Waals (vdW) epitaxy, is generally believed to involve both chemical and vdW interactions at the interface. To date, the competition between chemical and vdW interactions at the interface has yet to be established. In this work, we demonstrate that the chemical activity of deposited species is crucial for determining the structure of the 3D/2D heterointerface. During pulsed laser deposition, the chemical activity of SrTiO3 (STO) can be adjusted by controlling the oxygen partial pressure. Therefore, the relative contributions of chemical and vdW interactions at the STO/mica interface can be tuned. This finding ultimately explains the coexistence of [111] and [001] orientations in STO epitaxy on mica.
期刊介绍:
Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology.
In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics.
APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field.
Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.