端氢(100)金刚石缺陷识别及表面噪声来源

IF 4.3 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Yi-Ying Sung, Lachlan Oberg, Rebecca Griffin, Alex K. Schenk, Henry Chandler, Santiago Corujeira Gallo, Alastair Stacey, Tetiana Sergeieva, Marcus W. Doherty, Cedric Weber, Christopher I. Pakes
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引用次数: 0

摘要

近表面氮空位中心对许多基于金刚石的量子技术至关重要,例如信息处理器和纳米传感器。表面缺陷在这些器件的设计和性能中起着重要的作用。有针对性地制造缺陷是量子金刚石处理器纳米制造方法的核心,而不受控制的表面缺陷可能会产生噪声和电荷捕获,从而降低浅NV器件的性能。表面制备方案可能能够控制所需缺陷的产生并消除不需要的缺陷,但前提是它们的原子结构可以首先被确定。这项工作结合了扫描隧道显微镜(STM)成像和第一性原理模拟来识别化学气相沉积(CVD)制备的H:C(100) -2 × 1表面上的几个表面缺陷。阐明了这些缺陷的原子结构,通过对它们的顺磁性和受体态的建模,确定了磁噪声和电荷捕获的微观来源。通过STM尖端诱导的缺陷结构操纵,证明了对这些有害特性的初步控制。此外,通过确定负责新层成核的关键吸附剂,结果验证了CVD金刚石生长的公认模型。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Identification of Defects and the Origins of Surface Noise on Hydrogen–Terminated (100) Diamond

Identification of Defects and the Origins of Surface Noise on Hydrogen–Terminated (100) Diamond

Near-surface nitrogen vacancy centres are critical to many diamond-based quantum technologies such as information processors and nanosensors. Surface defects play an important role in the design and performance of these devices. The targeted creation of defects is central to proposed bottom-up approaches to nanofabrication of quantum diamond processors, and uncontrolled surface defects may generate noise and charge trapping which degrade shallow NV device performance. Surface preparation protocols may be able to control the production of desired defects and eliminate unwanted defects, but only if their atomic structure can first be conclusively identified. This work uses a combination of scanning tunnelling microscopy (STM) imaging and first-principles simulations to identify several surface defects on H:C(100)—2 × 1 surfaces prepared using chemical vapour deposition (CVD). The atomic structure of these defects is elucidated, from which the microscopic origins of magnetic noise and charge trapping are determined based on the modeling of their paramagnetic properties and acceptor states. Rudimentary control of these deleterious properties is demonstrated through STM tip-induced manipulation of the defect structure. Furthermore, the results validate accepted models for CVD diamond growth by identifying key adsorbates responsible for the nucleation of new layers.

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来源期刊
Advanced Materials Interfaces
Advanced Materials Interfaces CHEMISTRY, MULTIDISCIPLINARY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
8.40
自引率
5.60%
发文量
1174
审稿时长
1.3 months
期刊介绍: Advanced Materials Interfaces publishes top-level research on interface technologies and effects. Considering any interface formed between solids, liquids, and gases, the journal ensures an interdisciplinary blend of physics, chemistry, materials science, and life sciences. Advanced Materials Interfaces was launched in 2014 and received an Impact Factor of 4.834 in 2018. The scope of Advanced Materials Interfaces is dedicated to interfaces and surfaces that play an essential role in virtually all materials and devices. Physics, chemistry, materials science and life sciences blend to encourage new, cross-pollinating ideas, which will drive forward our understanding of the processes at the interface. Advanced Materials Interfaces covers all topics in interface-related research: Oil / water separation, Applications of nanostructured materials, 2D materials and heterostructures, Surfaces and interfaces in organic electronic devices, Catalysis and membranes, Self-assembly and nanopatterned surfaces, Composite and coating materials, Biointerfaces for technical and medical applications. Advanced Materials Interfaces provides a forum for topics on surface and interface science with a wide choice of formats: Reviews, Full Papers, and Communications, as well as Progress Reports and Research News.
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