Photothermal GO films with in-situ etching-growth stabilization strategy for adjustable and patterned personal thermal management

The development of advanced photothermal materials for personal thermal management is a prominent research focus, specifically aimed at enhancing thermal comfort and optimizing heat exchange between the human body and the environment. This study presents an innovative design strategy for photothermal graphene oxides (GO) films with in-situ incorporated metal ions, showcasing superior light absorption (up to 97.95 % for the GO-Zn-18 film), high photothermal conversion efficiency (reaching ∼67.2 °C under 1 solar illumination), and robust stability, with an adjustable temperature range spanning from 42.6 °C to 67.2 °C. Numerical analyses and simulations underscore the considerable superiority of the in-situ etching-growth stabilization strategy over conventional film fabrication techniques, allowing for precise temperature adjustment through the control of etching-growth duration. This adaptability facilitates broad applications, which can range from daily personal thermal regulation to high-temperature medical treatments. Moreover, the patterned and large-scale synthesis makes it a promising pathway from laboratory innovation to practical and industrially feasible solutions. The in-situ metal-ion-integrated photothermal GO films thus hold considerable potential in promoting photothermal conversion technologies for highly adaptable personal thermal management solutions.