紫外光下LaFeO3/TiO2纳米复合材料对亚甲基蓝降解的协同光催化活性研究

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
P. Balagoutham, K. Vallarasu, V. Sampathkumar, R. Anitha, V. Vijayalakshmi
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引用次数: 0

摘要

成功合成了 LaFeO3、TiO2 NPs 和 LaFeO3/TiO2 NCs,并进行了紫外光下光催化氧化水中亚甲基蓝染料的测试。XRD 分析证实,纯 LaFeO3 和 TiO2 NPs 分别呈现出正方晶相和金红石相。LaFeO3/TiO2 复合材料显示出 LaFeO3 和 TiO2 两相共存,没有任何附加峰。形态学研究显示,LaFeO3、TiO2 和 LaFeO3/TiO2 的球形 NPs 平均粒径约为 60 nm。与 TiO2 和 LaFeO3 NPs 相比,LaFeO3/TiO2 NCs 的紫外可见吸收光谱出现了明显的偏移。在紫外光照射 180 分钟后,根据水溶液中甲基溴的降解情况评估了样品的光催化活性。与 LaFeO3 NPs 相比,LaFeO3/TiO2 NCs 在紫外光下的光催化效率更高。此外,LaFeO3/TiO2 NCs 还具有出色的稳定性和可回收性,即使在循环使用五次后,其去除效率仍能保持在 93.5%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Synergistic photocatalytic activity of LaFeO3/TiO2 nanocomposites for methylene blue degradation under UV Light

LaFeO3, TiO2 NPs, and LaFeO3/TiO2 NCs were successfully synthesized and tested for the photocatalytic oxidation of methylene blue dye in water under UV light. XRD analyses confirmed that pure LaFeO3 and TiO2 NPs exhibit orthorhombic and rutile phases, respectively. The LaFeO3/TiO2 composite demonstrates the coexistence of both LaFeO3 and TiO2 phases without any additional peaks. Morphological investigation revealed spherical NPs, with the average particle size of LaFeO3, TiO2, and LaFeO3/TiO2 being approximately 60 nm. The UV–Vis absorption spectra of LaFeO3/TiO2 NCs show a notable shift compared to those of TiO2 and LaFeO3 NPs. The photocatalytic activity of the samples was evaluated based on the degradation of MB in aqueous solutions under 180 min of UV light irradiation. Compared to LaFeO3 NPs, LaFeO3/TiO2 NCs exhibit enhanced photocatalytic efficiency under UV light. Additionally, LaFeO3/TiO2 NCs demonstrate excellent stability and recyclability, maintaining a removal efficiency of 93.5% even after five cycles.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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