碳化硅单层是吸附 SF6 分解气体的理想材料

IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL
Silicon Pub Date : 2025-02-04 DOI:10.1007/s12633-025-03233-7
Maher Ali Rusho, Pawan Sharma, Soud Khalil Ibrahim, Hayder Hamid Abbas Al-Anbari, Aseel Salah Mansoor, Usama Kadem Radi, Ameer Hassan Idan, Hala Bahair, Masoud Alajmi
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引用次数: 0

摘要

识别对特定气体分子具有天然选择性的材料可以大大简化选择性和敏感气体传感器的设计。最近,研究人员已经认识到由III-IV族元素组成的单层材料是一种非常有前途的气体传感应用材料。本文重点研究了利用基于dft的第一性原理计算的单层碳化硅(SiC)气体吸附特性。为了评估吸附的强度和性质,我们分析了电荷转移(CT)、吸附能(Eads)和吸附距离。我们通过计算其功函数和电导率的变化来评估材料在功函数和电子气体传感器应用中的潜力。目前的研究主要集中在SF6分解气体的吸附上。具体来说,我们检测了SOF2和SO2F2在SiC单层上的化学吸附,这导致功函数的显著变化超过20%。此外,这些气体对SiC单层电导率有很大的影响。此外,我们观察到SOF2和SO2F2在室温下的恢复时间在毫秒范围内,特别是在600 K时。这表明SiC单层对SOF2和SO2F2具有高度选择性和敏感性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Silicon Carbide Monolayer as a Promising Material for the Adsorption of SF6 Decomposed Gases

Identifying materials that have naturally selectivity for specific gas molecules can greatly simplify designing of selective and sensitive gas sensors. Recently, researchers have recognized monolayers composed of group III–IV elements as a highly promising category of materials for gas sensing applications. This article focuses on the examination of gas adsorption characteristics of a monolayer of silicon carbide (SiC) using DFT-based first-principles computations. To assess the strength and nature of adsorption, we analyze charge transfer (CT), adsorption energy (Eads), and adsorption distance. We assess potential of material for work function and electronic-based gas sensor applications by computing variations in its work function and conductivity. In present research, we focused on adsorption of decomposed gases from SF6. Specifically, we examined the chemisorption of SOF2 and SO2F2 on the SiC monolayer, which resulted in a notable alteration of the work function by over 20%. Furthermore, these gases exhibited a substantial impact on SiC monolayer conductivity. Furthermore, we observed that recovery time for SOF2 and SO2F2 at room temperature is within the millisecond range, particularly at 600 K. This indicates a highly selective and sensitive response of the SiC monolayer to SOF2 and SO2F2.

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来源期刊
Silicon
Silicon CHEMISTRY, PHYSICAL-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.90
自引率
20.60%
发文量
685
审稿时长
>12 weeks
期刊介绍: The journal Silicon is intended to serve all those involved in studying the role of silicon as an enabling element in materials science. There are no restrictions on disciplinary boundaries provided the focus is on silicon-based materials or adds significantly to the understanding of such materials. Accordingly, such contributions are welcome in the areas of inorganic and organic chemistry, physics, biology, engineering, nanoscience, environmental science, electronics and optoelectronics, and modeling and theory. Relevant silicon-based materials include, but are not limited to, semiconductors, polymers, composites, ceramics, glasses, coatings, resins, composites, small molecules, and thin films.
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